Subspace Identification of a MIMO Wafer Rapid Thermal Processing System

This paper studies the subspace identification of a MIMO wafer rapid thermal processing (RTP) system driven by standard tungsten halogen lamps and output temperatures for the RTP system are measured by pyrometers. In order to estimate a linearized dynamic model for the nonlinear RTP system at an env...

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Main Authors: Liu, Xiao-You, Bian, Yan, Geng, Li-Hui
Format: Conference Proceeding
Language:English
Subjects:
MIMO
Process control
Rapid thermal processing
Semiconductor device modeling
Subspace Identification
Temperature measurement
Time-frequency analysis
Tracking loops
Tungsten
Wafer
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Bian, Yan
Geng, Li-Hui
description This paper studies the subspace identification of a MIMO wafer rapid thermal processing (RTP) system driven by standard tungsten halogen lamps and output temperatures for the RTP system are measured by pyrometers. In order to estimate a linearized dynamic model for the nonlinear RTP system at an environmental temperature, input voltages for the lamps are selected as mutually independent pseudo-random binary series (PRBS). To design such PRBS to persistently excite the system, several pre-experiments for determining its settling time and maximum frequency are needed to be designed beforehand. Finally, the effectiveness of the identification method is verified by a numerical simulation.
doi_str_mv 10.1109/CAC57257.2022.10054739
format conference_proceeding
fullrecord <record><control><sourceid>ieee_CHZPO</sourceid><recordid>TN_cdi_ieee_primary_10054739</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>10054739</ieee_id><sourcerecordid>10054739</sourcerecordid><originalsourceid>FETCH-LOGICAL-i119t-c0b52c614e24e5a45480841b9f5e40425799391aac8caec5cba4305353244a9e3</originalsourceid><addsrcrecordid>eNo1j8tKw0AUQEdBsNb-gcj8QOKdZ2aWJWgttFRsxWW5md7oSPMgExf9ewvq6uwO5zB2LyAXAvxDOS9NIU2RS5AyFwBGF8pfsBthrdHWKGUv2URa5zLwyl2zWUpfACCV0EbDhC2231XqMRBfHqgdYx0DjrFreVdz5OvlesPfsaaBv2IfD3z3SUODR_4ydIFSiu0H357SSM0tu6rxmGj2xyl7e3rclc_ZarNYlvNVFoXwYxagMjJYoUlqMnhucOC0qHxtSIM-n3ivvEAMLiAFEyrUCowySmqNntSU3f16IxHt-yE2OJz2_-PqB7TSS5Y</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Subspace Identification of a MIMO Wafer Rapid Thermal Processing System</title><source>IEEE Xplore All Conference Series</source><creator>Liu, Xiao-You ; Bian, Yan ; Geng, Li-Hui</creator><creatorcontrib>Liu, Xiao-You ; Bian, Yan ; Geng, Li-Hui</creatorcontrib><description>This paper studies the subspace identification of a MIMO wafer rapid thermal processing (RTP) system driven by standard tungsten halogen lamps and output temperatures for the RTP system are measured by pyrometers. In order to estimate a linearized dynamic model for the nonlinear RTP system at an environmental temperature, input voltages for the lamps are selected as mutually independent pseudo-random binary series (PRBS). To design such PRBS to persistently excite the system, several pre-experiments for determining its settling time and maximum frequency are needed to be designed beforehand. Finally, the effectiveness of the identification method is verified by a numerical simulation.</description><identifier>EISSN: 2688-0938</identifier><identifier>EISBN: 1665465336</identifier><identifier>EISBN: 9781665465335</identifier><identifier>DOI: 10.1109/CAC57257.2022.10054739</identifier><language>eng</language><publisher>IEEE</publisher><subject>MIMO ; Process control ; Rapid thermal processing ; Semiconductor device modeling ; Subspace Identification ; Temperature measurement ; Time-frequency analysis ; Tracking loops ; Tungsten ; Wafer</subject><ispartof>2022 China Automation Congress (CAC), 2022, p.3711-3715</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/10054739$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,23929,23930,25139,27924,54554,54931</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/10054739$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Liu, Xiao-You</creatorcontrib><creatorcontrib>Bian, Yan</creatorcontrib><creatorcontrib>Geng, Li-Hui</creatorcontrib><title>Subspace Identification of a MIMO Wafer Rapid Thermal Processing System</title><title>2022 China Automation Congress (CAC)</title><addtitle>CAC</addtitle><description>This paper studies the subspace identification of a MIMO wafer rapid thermal processing (RTP) system driven by standard tungsten halogen lamps and output temperatures for the RTP system are measured by pyrometers. In order to estimate a linearized dynamic model for the nonlinear RTP system at an environmental temperature, input voltages for the lamps are selected as mutually independent pseudo-random binary series (PRBS). To design such PRBS to persistently excite the system, several pre-experiments for determining its settling time and maximum frequency are needed to be designed beforehand. Finally, the effectiveness of the identification method is verified by a numerical simulation.</description><subject>MIMO</subject><subject>Process control</subject><subject>Rapid thermal processing</subject><subject>Semiconductor device modeling</subject><subject>Subspace Identification</subject><subject>Temperature measurement</subject><subject>Time-frequency analysis</subject><subject>Tracking loops</subject><subject>Tungsten</subject><subject>Wafer</subject><issn>2688-0938</issn><isbn>1665465336</isbn><isbn>9781665465335</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2022</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNo1j8tKw0AUQEdBsNb-gcj8QOKdZ2aWJWgttFRsxWW5md7oSPMgExf9ewvq6uwO5zB2LyAXAvxDOS9NIU2RS5AyFwBGF8pfsBthrdHWKGUv2URa5zLwyl2zWUpfACCV0EbDhC2231XqMRBfHqgdYx0DjrFreVdz5OvlesPfsaaBv2IfD3z3SUODR_4ydIFSiu0H357SSM0tu6rxmGj2xyl7e3rclc_ZarNYlvNVFoXwYxagMjJYoUlqMnhucOC0qHxtSIM-n3ivvEAMLiAFEyrUCowySmqNntSU3f16IxHt-yE2OJz2_-PqB7TSS5Y</recordid><startdate>20221125</startdate><enddate>20221125</enddate><creator>Liu, Xiao-You</creator><creator>Bian, Yan</creator><creator>Geng, Li-Hui</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>20221125</creationdate><title>Subspace Identification of a MIMO Wafer Rapid Thermal Processing System</title><author>Liu, Xiao-You ; Bian, Yan ; Geng, Li-Hui</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i119t-c0b52c614e24e5a45480841b9f5e40425799391aac8caec5cba4305353244a9e3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2022</creationdate><topic>MIMO</topic><topic>Process control</topic><topic>Rapid thermal processing</topic><topic>Semiconductor device modeling</topic><topic>Subspace Identification</topic><topic>Temperature measurement</topic><topic>Time-frequency analysis</topic><topic>Tracking loops</topic><topic>Tungsten</topic><topic>Wafer</topic><toplevel>online_resources</toplevel><creatorcontrib>Liu, Xiao-You</creatorcontrib><creatorcontrib>Bian, Yan</creatorcontrib><creatorcontrib>Geng, Li-Hui</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Liu, Xiao-You</au><au>Bian, Yan</au><au>Geng, Li-Hui</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Subspace Identification of a MIMO Wafer Rapid Thermal Processing System</atitle><btitle>2022 China Automation Congress (CAC)</btitle><stitle>CAC</stitle><date>2022-11-25</date><risdate>2022</risdate><spage>3711</spage><epage>3715</epage><pages>3711-3715</pages><eissn>2688-0938</eissn><eisbn>1665465336</eisbn><eisbn>9781665465335</eisbn><abstract>This paper studies the subspace identification of a MIMO wafer rapid thermal processing (RTP) system driven by standard tungsten halogen lamps and output temperatures for the RTP system are measured by pyrometers. In order to estimate a linearized dynamic model for the nonlinear RTP system at an environmental temperature, input voltages for the lamps are selected as mutually independent pseudo-random binary series (PRBS). To design such PRBS to persistently excite the system, several pre-experiments for determining its settling time and maximum frequency are needed to be designed beforehand. Finally, the effectiveness of the identification method is verified by a numerical simulation.</abstract><pub>IEEE</pub><doi>10.1109/CAC57257.2022.10054739</doi><tpages>5</tpages></addata></record>
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subjects MIMO
Process control
Rapid thermal processing
Semiconductor device modeling
Subspace Identification
Temperature measurement
Time-frequency analysis
Tracking loops
Tungsten
Wafer
title Subspace Identification of a MIMO Wafer Rapid Thermal Processing System
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T03%3A09%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_CHZPO&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Subspace%20Identification%20of%20a%20MIMO%20Wafer%20Rapid%20Thermal%20Processing%20System&rft.btitle=2022%20China%20Automation%20Congress%20(CAC)&rft.au=Liu,%20Xiao-You&rft.date=2022-11-25&rft.spage=3711&rft.epage=3715&rft.pages=3711-3715&rft.eissn=2688-0938&rft_id=info:doi/10.1109/CAC57257.2022.10054739&rft.eisbn=1665465336&rft.eisbn_list=9781665465335&rft_dat=%3Cieee_CHZPO%3E10054739%3C/ieee_CHZPO%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i119t-c0b52c614e24e5a45480841b9f5e40425799391aac8caec5cba4305353244a9e3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=10054739&rfr_iscdi=true