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Current Gain Reduction in Bipolar Junction Transistors Induced by Carbon Contamination from H3PO4-Based Etchant
A new mechanism contributed to current gain reduction in Bipolar Junction Transistors that was caused by contamination of H 3 PO 4 during silicon nitride removal has been investigated via various physical analysis and electrical characterization. Based on energy-dispersive X-ray spectroscopy/transmi...
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creator | Lik, Tan Chan Ning, Lim Chui Wai, Wan Tatt Johan, Norjuliani Zakaria, Zafirah Cheong, Kuan Yew |
description | A new mechanism contributed to current gain reduction in Bipolar Junction Transistors that was caused by contamination of H 3 PO 4 during silicon nitride removal has been investigated via various physical analysis and electrical characterization. Based on energy-dispersive X-ray spectroscopy/transmission electron microscopy and X-ray photoelectron spectroscopy results, carbon and carbide related compounds can be detected in the bulk silicon nitride. This may be the possible root cause of low current gain in the transistors. |
doi_str_mv | 10.1109/ASMC57536.2023.10121127 |
format | conference_proceeding |
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Based on energy-dispersive X-ray spectroscopy/transmission electron microscopy and X-ray photoelectron spectroscopy results, carbon and carbide related compounds can be detected in the bulk silicon nitride. This may be the possible root cause of low current gain in the transistors.</abstract><pub>IEEE</pub><doi>10.1109/ASMC57536.2023.10121127</doi><tpages>3</tpages></addata></record> |
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identifier | EISSN: 2376-6697 |
ispartof | 2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2023, p.1-3 |
issn | 2376-6697 |
language | eng |
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source | IEEE Xplore All Conference Series |
subjects | BJT Carbide Etching Phosphoric acid Photoelectron microscopy Semiconductor device manufacture Silicon Silicon nitride Spectroscopy TEM Transistors XPS |
title | Current Gain Reduction in Bipolar Junction Transistors Induced by Carbon Contamination from H3PO4-Based Etchant |
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