Random Forest Based R2R Control: Application to Chemical Mechanical Planarization Process

In this paper, a Random Forest based run-to-run controller is developed to meet the challenges of a high-mix production. The model that relates the optimal recipe parameter with various industrial features is trained off-line from historical data. The predicted optimal recipe parameter is used on-li...

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Bibliographic Details
Main Authors: Terras, Lucile, Alegret, Cyril, Pasqualini, Francois, Roussy, Agnes
Format: Conference Proceeding
Language:English
Subjects:
Chemical Mechanical Planarization Process
Data models
Forestry
High-mix
Planarization
Process control
Production
Random Forest
Run-to-Run
Semiconductor device manufacture
Semiconductor device modeling
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Summary:In this paper, a Random Forest based run-to-run controller is developed to meet the challenges of a high-mix production. The model that relates the optimal recipe parameter with various industrial features is trained off-line from historical data. The predicted optimal recipe parameter is used on-line to tune the process condition. Numerical experiments conducted on a Chemical Mechanical Planarization process are presented to illustrate the performance of the controller. Compared with the system in production, the proposed approach demonstrates higher flexibility and efficiency.
ISSN:2376-6697
DOI:10.1109/ASMC57536.2023.10121144