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GaN SLCFET Technology for Next Generation mmW Systems, Demonstrating P} of 10.87 W/mm With 43% PAE at 94 GHz

We report on the development of the super-lattice castellated field effect transistor (SLCFET) technology as a candidate for the next generation of mmW and W -band systems, leveraging the high carrier density and a high degree of charge control offered by this device topology for mmW and W -band p...

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Bibliographic Details
Published in:IEEE microwave and wireless technology letters (Print) 2023-05, p.1-4
Main Authors: Howell, Robert S., Novak, Brian, Vasen, Timothy, Shea, Patrick, Chang, Josephine, Afroz, Shamima
Format: Article
Language:English
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Summary:We report on the development of the super-lattice castellated field effect transistor (SLCFET) technology as a candidate for the next generation of mmW and W -band systems, leveraging the high carrier density and a high degree of charge control offered by this device topology for mmW and W -band power amplification. The SLCFET is built using a superlattice of stacked AlGaN/gallium nitride (GaN) heterostructures that are etched into nanoribbons between epitaxial regrown n + GaN source and drain contacts and controlled with a 100 nm length T-gate that electrostatically actuates the stacked channels from the sidewalls. The 2 \times 20 \mu m amplifier cells of SLCFET devices were measured using load-pull at 94 GHz using a 12-V bias, demonstrating amplifier output power densities of 10.87 W/mm with 43% power added efficiency (PAE) at peak power and a maximum linear gain of 5.4 dB. The SLCFET amplifier process attains this power density due to its extremely high current density, with an IMAX of 4.8 A/mm, along with its minimal dispersion, with current collapse measured using pulsed I - V at
ISSN:2771-957X
DOI:10.1109/LMWT.2023.3271862