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Fabrication of CoFeB-SiO2 Films with Large Uniaxial Anisotropic by Facing Target Sputtering and its Application to High Frequency Planar Type Spiral Inductors

A comprehensive study on fabrication of CoFeB-SiO 2 films with large in-plane magnetic anisotropy for the use in high frequency inductors in power electronics circuits was conducted. The magnetic films were deposited using facing target sputtering which can introduce large uniaxial magnetic anisotro...

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Bibliographic Details
Published in:IEEE transactions on magnetics 2023-07, p.1-1
Main Authors: Takamura, Yota, Nitta, Honami, Kawahara, Kazuma, Kaneko, Tadayuki, Ishido, Ryosuke, Miyazaki, Tatsuya, Hosoda, Naoki, Fujisaki, Keisuke, Nakagawa, Shigeki
Format: Article
Language:English
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Summary:A comprehensive study on fabrication of CoFeB-SiO 2 films with large in-plane magnetic anisotropy for the use in high frequency inductors in power electronics circuits was conducted. The magnetic films were deposited using facing target sputtering which can introduce large uniaxial magnetic anisotropy in the plane. A multilayer structure consisting of CoFeB-SiO 2 and SiO 2 layers suppressed columnar growth and thus reduced undesired perpendicular magnetic anisotropy. As a result, a 1 μm thick magnetic layer was achieved with excellent soft magnetic properties and no stripe domain structure. The effectiveness of these magnetic films was demonstrated by fabricating and characterizing planar type spiral coils. This development of micro magnetic inductors using the magnetic layer shows great potential for use in high frequency power electronics applications.
ISSN:0018-9464
DOI:10.1109/TMAG.2023.3291879