Loading…
Technology Dependence of Stuck Bits and Single Event Upsets in 110, 72, and 63-nm SDRAMs
Three SDRAMs from the same manufacturer with technology node sizes 110, 72, and 63 nm, were investigated under proton irradiation and using scanning electron microscopy (SEM). The radiation-induced faults were characterized and compared between the different part types. The devices under test (DUT)...
Saved in:
Published in: | IEEE transactions on nuclear science 2023-08, Vol.70 (8), p.1-1 |
---|---|
Main Authors: | , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c368t-fc67c08d83037bf270e2f88d134235ae7113bc112203061efe590d49af9564393 |
---|---|
cites | cdi_FETCH-LOGICAL-c368t-fc67c08d83037bf270e2f88d134235ae7113bc112203061efe590d49af9564393 |
container_end_page | 1 |
container_issue | 8 |
container_start_page | 1 |
container_title | IEEE transactions on nuclear science |
container_volume | 70 |
creator | Soderstrom, Daniel Luza, Lucas Matana De Mattos, Andre Martins Pio Gil, Thierry Kettunen, Heikki Niskanen, Kimmo Javanainen, Arto Dilillo, Luigi |
description | Three SDRAMs from the same manufacturer with technology node sizes 110, 72, and 63 nm, were investigated under proton irradiation and using scanning electron microscopy (SEM). The radiation-induced faults were characterized and compared between the different part types. The devices under test (DUT) were irradiated with protons and experienced single event effects (SEE) in the form of stuck bits and single bit upsets (SBU). Analysis of the data retention times of bits which had SBU and were stuck during irradiation, showed similar patterns of retention time degradation, suggesting that the SBUs and stuck bits in all three part types could be induced by the same mechanism. Detailed data retention time analyses were also performed before and after irradiation to investigate the evolution of data retention times after irradiation, and after periods of annealing. The largest radiation-induced retention time losses were found to anneal, but the bits least affected directly after irradiation experienced decreasing data retention time as a function of annealing time. SEM imaging showed differences in the memory cell structure between the tested part types. The largest node size device was the most sensitive to the radiation, both for SEE and cumulative radiation effects. |
doi_str_mv | 10.1109/TNS.2023.3295435 |
format | article |
fullrecord | <record><control><sourceid>proquest_ieee_</sourceid><recordid>TN_cdi_ieee_primary_10184045</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>10184045</ieee_id><sourcerecordid>2851333864</sourcerecordid><originalsourceid>FETCH-LOGICAL-c368t-fc67c08d83037bf270e2f88d134235ae7113bc112203061efe590d49af9564393</originalsourceid><addsrcrecordid>eNpNkEFLw0AQhRdRsFbvHjwseBKaurOzm-weq61WqAq2BW9LTCY2tW5qNhX896ZWxNMwj--9GR5jpyD6AMJezh6mfSkk9lFarVDvsQ5obSLQidlnHSHARFZZe8iOQli2q9JCd9jzjLKFr1bV6xcf0pp8Tj4jXhV82myyN35VNoGnPufT0r-uiI8-yTd8vg7U6qXn7e0eT2Tvh4kx8u98Onwa3IdjdlCkq0Anv7PL5jej2fU4mjze3l0PJlGGsWmiIouTTJjcoMDkpZCJIFkYkwMqiTqlBABfMgApBYoYqCBtRa5sWlgdK7TYZRe73EW6cuu6fE_rL1elpRsPJm6rCQVWWtCf0LLnO3ZdVx8bCo1bVpvat-85aTQgomkzu0zsqKyuQqip-IsF4bZdu7Zrt-3a_XbdWs52lpKI_uFglFAavwHx_nUH</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2851333864</pqid></control><display><type>article</type><title>Technology Dependence of Stuck Bits and Single Event Upsets in 110, 72, and 63-nm SDRAMs</title><source>IEEE Xplore (Online service)</source><creator>Soderstrom, Daniel ; Luza, Lucas Matana ; De Mattos, Andre Martins Pio ; Gil, Thierry ; Kettunen, Heikki ; Niskanen, Kimmo ; Javanainen, Arto ; Dilillo, Luigi</creator><creatorcontrib>Soderstrom, Daniel ; Luza, Lucas Matana ; De Mattos, Andre Martins Pio ; Gil, Thierry ; Kettunen, Heikki ; Niskanen, Kimmo ; Javanainen, Arto ; Dilillo, Luigi</creatorcontrib><description>Three SDRAMs from the same manufacturer with technology node sizes 110, 72, and 63 nm, were investigated under proton irradiation and using scanning electron microscopy (SEM). The radiation-induced faults were characterized and compared between the different part types. The devices under test (DUT) were irradiated with protons and experienced single event effects (SEE) in the form of stuck bits and single bit upsets (SBU). Analysis of the data retention times of bits which had SBU and were stuck during irradiation, showed similar patterns of retention time degradation, suggesting that the SBUs and stuck bits in all three part types could be induced by the same mechanism. Detailed data retention time analyses were also performed before and after irradiation to investigate the evolution of data retention times after irradiation, and after periods of annealing. The largest radiation-induced retention time losses were found to anneal, but the bits least affected directly after irradiation experienced decreasing data retention time as a function of annealing time. SEM imaging showed differences in the memory cell structure between the tested part types. The largest node size device was the most sensitive to the radiation, both for SEE and cumulative radiation effects.</description><identifier>ISSN: 0018-9499</identifier><identifier>EISSN: 1558-1578</identifier><identifier>DOI: 10.1109/TNS.2023.3295435</identifier><identifier>CODEN: IETNAE</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Annealing ; Capacitors ; Computer Science ; Cytology ; Data analysis ; Dynamic random access memory ; Electron microscopes ; Electronics ; Embedded Systems ; Engineering Sciences ; Irradiation ; Micro and nanotechnologies ; Microelectronics ; Proton Irradiation ; Protons ; Radiation ; Radiation effects ; Retention ; Retention Time ; Scanning electron microscopy ; SDRAM ; Single Event Effects ; Single event upsets ; Stuck Bits ; Technology ; Technology Nodes ; Testing ; Transistors</subject><ispartof>IEEE transactions on nuclear science, 2023-08, Vol.70 (8), p.1-1</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2023</rights><rights>Attribution</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c368t-fc67c08d83037bf270e2f88d134235ae7113bc112203061efe590d49af9564393</citedby><cites>FETCH-LOGICAL-c368t-fc67c08d83037bf270e2f88d134235ae7113bc112203061efe590d49af9564393</cites><orcidid>0000-0002-1295-2688 ; 0000-0003-1083-1273 ; 0000-0002-8457-5404 ; 0000-0003-4633-9483 ; 0000-0001-7906-3669 ; 0000-0003-4811-6777 ; 0000-0001-9872-2199</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/10184045$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>230,314,780,784,885,27924,27925,54796</link.rule.ids><backlink>$$Uhttps://hal.science/hal-04192915$$DView record in HAL$$Hfree_for_read</backlink></links><search><creatorcontrib>Soderstrom, Daniel</creatorcontrib><creatorcontrib>Luza, Lucas Matana</creatorcontrib><creatorcontrib>De Mattos, Andre Martins Pio</creatorcontrib><creatorcontrib>Gil, Thierry</creatorcontrib><creatorcontrib>Kettunen, Heikki</creatorcontrib><creatorcontrib>Niskanen, Kimmo</creatorcontrib><creatorcontrib>Javanainen, Arto</creatorcontrib><creatorcontrib>Dilillo, Luigi</creatorcontrib><title>Technology Dependence of Stuck Bits and Single Event Upsets in 110, 72, and 63-nm SDRAMs</title><title>IEEE transactions on nuclear science</title><addtitle>TNS</addtitle><description>Three SDRAMs from the same manufacturer with technology node sizes 110, 72, and 63 nm, were investigated under proton irradiation and using scanning electron microscopy (SEM). The radiation-induced faults were characterized and compared between the different part types. The devices under test (DUT) were irradiated with protons and experienced single event effects (SEE) in the form of stuck bits and single bit upsets (SBU). Analysis of the data retention times of bits which had SBU and were stuck during irradiation, showed similar patterns of retention time degradation, suggesting that the SBUs and stuck bits in all three part types could be induced by the same mechanism. Detailed data retention time analyses were also performed before and after irradiation to investigate the evolution of data retention times after irradiation, and after periods of annealing. The largest radiation-induced retention time losses were found to anneal, but the bits least affected directly after irradiation experienced decreasing data retention time as a function of annealing time. SEM imaging showed differences in the memory cell structure between the tested part types. The largest node size device was the most sensitive to the radiation, both for SEE and cumulative radiation effects.</description><subject>Annealing</subject><subject>Capacitors</subject><subject>Computer Science</subject><subject>Cytology</subject><subject>Data analysis</subject><subject>Dynamic random access memory</subject><subject>Electron microscopes</subject><subject>Electronics</subject><subject>Embedded Systems</subject><subject>Engineering Sciences</subject><subject>Irradiation</subject><subject>Micro and nanotechnologies</subject><subject>Microelectronics</subject><subject>Proton Irradiation</subject><subject>Protons</subject><subject>Radiation</subject><subject>Radiation effects</subject><subject>Retention</subject><subject>Retention Time</subject><subject>Scanning electron microscopy</subject><subject>SDRAM</subject><subject>Single Event Effects</subject><subject>Single event upsets</subject><subject>Stuck Bits</subject><subject>Technology</subject><subject>Technology Nodes</subject><subject>Testing</subject><subject>Transistors</subject><issn>0018-9499</issn><issn>1558-1578</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><recordid>eNpNkEFLw0AQhRdRsFbvHjwseBKaurOzm-weq61WqAq2BW9LTCY2tW5qNhX896ZWxNMwj--9GR5jpyD6AMJezh6mfSkk9lFarVDvsQ5obSLQidlnHSHARFZZe8iOQli2q9JCd9jzjLKFr1bV6xcf0pp8Tj4jXhV82myyN35VNoGnPufT0r-uiI8-yTd8vg7U6qXn7e0eT2Tvh4kx8u98Onwa3IdjdlCkq0Anv7PL5jej2fU4mjze3l0PJlGGsWmiIouTTJjcoMDkpZCJIFkYkwMqiTqlBABfMgApBYoYqCBtRa5sWlgdK7TYZRe73EW6cuu6fE_rL1elpRsPJm6rCQVWWtCf0LLnO3ZdVx8bCo1bVpvat-85aTQgomkzu0zsqKyuQqip-IsF4bZdu7Zrt-3a_XbdWs52lpKI_uFglFAavwHx_nUH</recordid><startdate>20230801</startdate><enddate>20230801</enddate><creator>Soderstrom, Daniel</creator><creator>Luza, Lucas Matana</creator><creator>De Mattos, Andre Martins Pio</creator><creator>Gil, Thierry</creator><creator>Kettunen, Heikki</creator><creator>Niskanen, Kimmo</creator><creator>Javanainen, Arto</creator><creator>Dilillo, Luigi</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><general>Institute of Electrical and Electronics Engineers</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7QL</scope><scope>7QQ</scope><scope>7SC</scope><scope>7SE</scope><scope>7SP</scope><scope>7SR</scope><scope>7T7</scope><scope>7TA</scope><scope>7TB</scope><scope>7U5</scope><scope>7U9</scope><scope>8BQ</scope><scope>8FD</scope><scope>C1K</scope><scope>F28</scope><scope>FR3</scope><scope>H8D</scope><scope>H94</scope><scope>JG9</scope><scope>JQ2</scope><scope>KR7</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope><scope>M7N</scope><scope>P64</scope><scope>1XC</scope><scope>VOOES</scope><orcidid>https://orcid.org/0000-0002-1295-2688</orcidid><orcidid>https://orcid.org/0000-0003-1083-1273</orcidid><orcidid>https://orcid.org/0000-0002-8457-5404</orcidid><orcidid>https://orcid.org/0000-0003-4633-9483</orcidid><orcidid>https://orcid.org/0000-0001-7906-3669</orcidid><orcidid>https://orcid.org/0000-0003-4811-6777</orcidid><orcidid>https://orcid.org/0000-0001-9872-2199</orcidid></search><sort><creationdate>20230801</creationdate><title>Technology Dependence of Stuck Bits and Single Event Upsets in 110, 72, and 63-nm SDRAMs</title><author>Soderstrom, Daniel ; Luza, Lucas Matana ; De Mattos, Andre Martins Pio ; Gil, Thierry ; Kettunen, Heikki ; Niskanen, Kimmo ; Javanainen, Arto ; Dilillo, Luigi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c368t-fc67c08d83037bf270e2f88d134235ae7113bc112203061efe590d49af9564393</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Annealing</topic><topic>Capacitors</topic><topic>Computer Science</topic><topic>Cytology</topic><topic>Data analysis</topic><topic>Dynamic random access memory</topic><topic>Electron microscopes</topic><topic>Electronics</topic><topic>Embedded Systems</topic><topic>Engineering Sciences</topic><topic>Irradiation</topic><topic>Micro and nanotechnologies</topic><topic>Microelectronics</topic><topic>Proton Irradiation</topic><topic>Protons</topic><topic>Radiation</topic><topic>Radiation effects</topic><topic>Retention</topic><topic>Retention Time</topic><topic>Scanning electron microscopy</topic><topic>SDRAM</topic><topic>Single Event Effects</topic><topic>Single event upsets</topic><topic>Stuck Bits</topic><topic>Technology</topic><topic>Technology Nodes</topic><topic>Testing</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Soderstrom, Daniel</creatorcontrib><creatorcontrib>Luza, Lucas Matana</creatorcontrib><creatorcontrib>De Mattos, Andre Martins Pio</creatorcontrib><creatorcontrib>Gil, Thierry</creatorcontrib><creatorcontrib>Kettunen, Heikki</creatorcontrib><creatorcontrib>Niskanen, Kimmo</creatorcontrib><creatorcontrib>Javanainen, Arto</creatorcontrib><creatorcontrib>Dilillo, Luigi</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Xplore (Online service)</collection><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Bacteriology Abstracts (Microbiology B)</collection><collection>Ceramic Abstracts</collection><collection>Computer and Information Systems Abstracts</collection><collection>Corrosion Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Industrial and Applied Microbiology Abstracts (Microbiology A)</collection><collection>Materials Business File</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Virology and AIDS Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Environmental Sciences and Pollution Management</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Aerospace Database</collection><collection>AIDS and Cancer Research Abstracts</collection><collection>Materials Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts – Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><collection>Algology Mycology and Protozoology Abstracts (Microbiology C)</collection><collection>Biotechnology and BioEngineering Abstracts</collection><collection>Hyper Article en Ligne (HAL)</collection><collection>Hyper Article en Ligne (HAL) (Open Access)</collection><jtitle>IEEE transactions on nuclear science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Soderstrom, Daniel</au><au>Luza, Lucas Matana</au><au>De Mattos, Andre Martins Pio</au><au>Gil, Thierry</au><au>Kettunen, Heikki</au><au>Niskanen, Kimmo</au><au>Javanainen, Arto</au><au>Dilillo, Luigi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Technology Dependence of Stuck Bits and Single Event Upsets in 110, 72, and 63-nm SDRAMs</atitle><jtitle>IEEE transactions on nuclear science</jtitle><stitle>TNS</stitle><date>2023-08-01</date><risdate>2023</risdate><volume>70</volume><issue>8</issue><spage>1</spage><epage>1</epage><pages>1-1</pages><issn>0018-9499</issn><eissn>1558-1578</eissn><coden>IETNAE</coden><abstract>Three SDRAMs from the same manufacturer with technology node sizes 110, 72, and 63 nm, were investigated under proton irradiation and using scanning electron microscopy (SEM). The radiation-induced faults were characterized and compared between the different part types. The devices under test (DUT) were irradiated with protons and experienced single event effects (SEE) in the form of stuck bits and single bit upsets (SBU). Analysis of the data retention times of bits which had SBU and were stuck during irradiation, showed similar patterns of retention time degradation, suggesting that the SBUs and stuck bits in all three part types could be induced by the same mechanism. Detailed data retention time analyses were also performed before and after irradiation to investigate the evolution of data retention times after irradiation, and after periods of annealing. The largest radiation-induced retention time losses were found to anneal, but the bits least affected directly after irradiation experienced decreasing data retention time as a function of annealing time. SEM imaging showed differences in the memory cell structure between the tested part types. The largest node size device was the most sensitive to the radiation, both for SEE and cumulative radiation effects.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TNS.2023.3295435</doi><tpages>1</tpages><orcidid>https://orcid.org/0000-0002-1295-2688</orcidid><orcidid>https://orcid.org/0000-0003-1083-1273</orcidid><orcidid>https://orcid.org/0000-0002-8457-5404</orcidid><orcidid>https://orcid.org/0000-0003-4633-9483</orcidid><orcidid>https://orcid.org/0000-0001-7906-3669</orcidid><orcidid>https://orcid.org/0000-0003-4811-6777</orcidid><orcidid>https://orcid.org/0000-0001-9872-2199</orcidid><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0018-9499 |
ispartof | IEEE transactions on nuclear science, 2023-08, Vol.70 (8), p.1-1 |
issn | 0018-9499 1558-1578 |
language | eng |
recordid | cdi_ieee_primary_10184045 |
source | IEEE Xplore (Online service) |
subjects | Annealing Capacitors Computer Science Cytology Data analysis Dynamic random access memory Electron microscopes Electronics Embedded Systems Engineering Sciences Irradiation Micro and nanotechnologies Microelectronics Proton Irradiation Protons Radiation Radiation effects Retention Retention Time Scanning electron microscopy SDRAM Single Event Effects Single event upsets Stuck Bits Technology Technology Nodes Testing Transistors |
title | Technology Dependence of Stuck Bits and Single Event Upsets in 110, 72, and 63-nm SDRAMs |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T16%3A03%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_ieee_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Technology%20Dependence%20of%20Stuck%20Bits%20and%20Single%20Event%20Upsets%20in%20110,%2072,%20and%2063-nm%20SDRAMs&rft.jtitle=IEEE%20transactions%20on%20nuclear%20science&rft.au=Soderstrom,%20Daniel&rft.date=2023-08-01&rft.volume=70&rft.issue=8&rft.spage=1&rft.epage=1&rft.pages=1-1&rft.issn=0018-9499&rft.eissn=1558-1578&rft.coden=IETNAE&rft_id=info:doi/10.1109/TNS.2023.3295435&rft_dat=%3Cproquest_ieee_%3E2851333864%3C/proquest_ieee_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c368t-fc67c08d83037bf270e2f88d134235ae7113bc112203061efe590d49af9564393%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2851333864&rft_id=info:pmid/&rft_ieee_id=10184045&rfr_iscdi=true |