Investigation of the Strength of a Multilayer Electromagnetic Shield to the Effects of Temperature

An important issue in the development of technical systems is their protection from the effects of electromagnetic radiation, which can be solved using thin Ni films. In this work, samples of thin Ni films with a thickness of 27 to 145 nm were studied. An electromagnetic screen using poly-para-xylyl...

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Bibliographic Details
Main Authors: Testov, Igor O., Korlyakov, Andrey V., Testov, Oleg A., Khmelnitskiy, Ivan K., Chkalov, Victor A.
Format: Conference Proceeding
Language:English
Subjects:
Dielectrics
Electrical engineering
Electromagnetic radiation
electromagnetic shielding
Nickel
nickel film
Nonhomogeneous media
scattering matrix coefficient S21
Temperature distribution
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Summary:An important issue in the development of technical systems is their protection from the effects of electromagnetic radiation, which can be solved using thin Ni films. In this work, samples of thin Ni films with a thickness of 27 to 145 nm were studied. An electromagnetic screen using poly-para-xylylene (thickness 15\ \mu\mathrm{m}) and nickel (thickness 65 nm) provides shielding of at least −22 dB over the entire researched frequency range (from 2 to 6 GHz) when exposed to temperatures up to 140°C.
ISSN:2771-697X
DOI:10.1109/EExPolytech58658.2023.10318641