Algorithm for analyzing optimal mask movement pattern in moving mask deep X-ray lithography

Moving mask deep X-ray lithography has demonstrated its feasibility for fabricating some 3-dimensional (3D) microstructures such as micro-nozzles and micro-lens arrays and so on. In this technique, the determination of mask movement patterns is crucial for realizing the desired target microstructure...

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Main Authors: Matsuzuka, N., Tabata, O.
Format: Conference Proceeding
Language:English
Subjects:
Algorithm design and analysis
Fabrication
Inorganic materials
Mechanical systems
Micromechanical devices
Microstructure
Pattern analysis
Resists
Shape control
X-ray lithography
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Tabata, O.
description Moving mask deep X-ray lithography has demonstrated its feasibility for fabricating some 3-dimensional (3D) microstructures such as micro-nozzles and micro-lens arrays and so on. In this technique, the determination of mask movement patterns is crucial for realizing the desired target microstructures. For theoretical determination of optimal movement patterns, an algorithm exploiting the Fourier transformation technique called "Inverse Approach" was proposed. As a first step towards the completion of the Inverse Approach, the algorithm limited to the 2 space dimensions, vertical and lateral, was developed. Straightforward application of this algorithm to the fabrication of V-shaped grooves did not yield satisfying results. We reported an adopted version of this algorithm which ultimately allowed successful fabrication of the V-shaped grooves. Furthermore, this algorithm could be applied to the determination of an optimal mask.
doi_str_mv 10.1109/MHS.2002.1058027
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fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_1058027</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1058027</ieee_id><sourcerecordid>1058027</sourcerecordid><originalsourceid>FETCH-LOGICAL-i175t-c7bc59b6b3493076a5a90beb580e61a2c73f2547b9f31adbb2725febf12b1613</originalsourceid><addsrcrecordid>eNotT01LAzEUDIig1t4FL_kDW1-SZtMcS1FbqHiwB8FDedm-bKP7RTYI6693q53LwMwwzDB2J2AmBNiHl_XbTALImQC9AGku2A2YBSiTj_YVm_b9J4xQVmuAa_axrMo2hnSsuW8jxwar4Sc0JW-7FGqseI39F6_bb6qpSbzDlCg2PDQn7ZT78w9EHX_PIg68GrvaMmJ3HG7Zpceqp-mZJ2z39LhbrbPt6_NmtdxmQRidssK4QluXOzW3CkyOGi04cuN8ygXKwigv9dw465XAg3PSSO3JeSGdyIWasPv_2kBE-y6Os-OwP99XvxocUaI</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Algorithm for analyzing optimal mask movement pattern in moving mask deep X-ray lithography</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Matsuzuka, N. ; Tabata, O.</creator><creatorcontrib>Matsuzuka, N. ; Tabata, O.</creatorcontrib><description>Moving mask deep X-ray lithography has demonstrated its feasibility for fabricating some 3-dimensional (3D) microstructures such as micro-nozzles and micro-lens arrays and so on. In this technique, the determination of mask movement patterns is crucial for realizing the desired target microstructures. For theoretical determination of optimal movement patterns, an algorithm exploiting the Fourier transformation technique called "Inverse Approach" was proposed. As a first step towards the completion of the Inverse Approach, the algorithm limited to the 2 space dimensions, vertical and lateral, was developed. Straightforward application of this algorithm to the fabrication of V-shaped grooves did not yield satisfying results. We reported an adopted version of this algorithm which ultimately allowed successful fabrication of the V-shaped grooves. Furthermore, this algorithm could be applied to the determination of an optimal mask.</description><identifier>ISBN: 0780376110</identifier><identifier>ISBN: 9780780376113</identifier><identifier>DOI: 10.1109/MHS.2002.1058027</identifier><language>eng</language><publisher>IEEE</publisher><subject>Algorithm design and analysis ; Fabrication ; Inorganic materials ; Mechanical systems ; Micromechanical devices ; Microstructure ; Pattern analysis ; Resists ; Shape control ; X-ray lithography</subject><ispartof>Proceedings of 2002 International Symposium on Micromechatronics and Human Science, 2002, p.159-164</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1058027$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,777,781,786,787,2052,4036,4037,27906,54901</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1058027$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Matsuzuka, N.</creatorcontrib><creatorcontrib>Tabata, O.</creatorcontrib><title>Algorithm for analyzing optimal mask movement pattern in moving mask deep X-ray lithography</title><title>Proceedings of 2002 International Symposium on Micromechatronics and Human Science</title><addtitle>MHS</addtitle><description>Moving mask deep X-ray lithography has demonstrated its feasibility for fabricating some 3-dimensional (3D) microstructures such as micro-nozzles and micro-lens arrays and so on. In this technique, the determination of mask movement patterns is crucial for realizing the desired target microstructures. For theoretical determination of optimal movement patterns, an algorithm exploiting the Fourier transformation technique called "Inverse Approach" was proposed. As a first step towards the completion of the Inverse Approach, the algorithm limited to the 2 space dimensions, vertical and lateral, was developed. Straightforward application of this algorithm to the fabrication of V-shaped grooves did not yield satisfying results. We reported an adopted version of this algorithm which ultimately allowed successful fabrication of the V-shaped grooves. Furthermore, this algorithm could be applied to the determination of an optimal mask.</description><subject>Algorithm design and analysis</subject><subject>Fabrication</subject><subject>Inorganic materials</subject><subject>Mechanical systems</subject><subject>Micromechanical devices</subject><subject>Microstructure</subject><subject>Pattern analysis</subject><subject>Resists</subject><subject>Shape control</subject><subject>X-ray lithography</subject><isbn>0780376110</isbn><isbn>9780780376113</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2002</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNotT01LAzEUDIig1t4FL_kDW1-SZtMcS1FbqHiwB8FDedm-bKP7RTYI6693q53LwMwwzDB2J2AmBNiHl_XbTALImQC9AGku2A2YBSiTj_YVm_b9J4xQVmuAa_axrMo2hnSsuW8jxwar4Sc0JW-7FGqseI39F6_bb6qpSbzDlCg2PDQn7ZT78w9EHX_PIg68GrvaMmJ3HG7Zpceqp-mZJ2z39LhbrbPt6_NmtdxmQRidssK4QluXOzW3CkyOGi04cuN8ygXKwigv9dw465XAg3PSSO3JeSGdyIWasPv_2kBE-y6Os-OwP99XvxocUaI</recordid><startdate>2002</startdate><enddate>2002</enddate><creator>Matsuzuka, N.</creator><creator>Tabata, O.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>2002</creationdate><title>Algorithm for analyzing optimal mask movement pattern in moving mask deep X-ray lithography</title><author>Matsuzuka, N. ; Tabata, O.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i175t-c7bc59b6b3493076a5a90beb580e61a2c73f2547b9f31adbb2725febf12b1613</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2002</creationdate><topic>Algorithm design and analysis</topic><topic>Fabrication</topic><topic>Inorganic materials</topic><topic>Mechanical systems</topic><topic>Micromechanical devices</topic><topic>Microstructure</topic><topic>Pattern analysis</topic><topic>Resists</topic><topic>Shape control</topic><topic>X-ray lithography</topic><toplevel>online_resources</toplevel><creatorcontrib>Matsuzuka, N.</creatorcontrib><creatorcontrib>Tabata, O.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Xplore</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Matsuzuka, N.</au><au>Tabata, O.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Algorithm for analyzing optimal mask movement pattern in moving mask deep X-ray lithography</atitle><btitle>Proceedings of 2002 International Symposium on Micromechatronics and Human Science</btitle><stitle>MHS</stitle><date>2002</date><risdate>2002</risdate><spage>159</spage><epage>164</epage><pages>159-164</pages><isbn>0780376110</isbn><isbn>9780780376113</isbn><abstract>Moving mask deep X-ray lithography has demonstrated its feasibility for fabricating some 3-dimensional (3D) microstructures such as micro-nozzles and micro-lens arrays and so on. In this technique, the determination of mask movement patterns is crucial for realizing the desired target microstructures. For theoretical determination of optimal movement patterns, an algorithm exploiting the Fourier transformation technique called "Inverse Approach" was proposed. As a first step towards the completion of the Inverse Approach, the algorithm limited to the 2 space dimensions, vertical and lateral, was developed. Straightforward application of this algorithm to the fabrication of V-shaped grooves did not yield satisfying results. We reported an adopted version of this algorithm which ultimately allowed successful fabrication of the V-shaped grooves. Furthermore, this algorithm could be applied to the determination of an optimal mask.</abstract><pub>IEEE</pub><doi>10.1109/MHS.2002.1058027</doi><tpages>6</tpages></addata></record>
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subjects Algorithm design and analysis
Fabrication
Inorganic materials
Mechanical systems
Micromechanical devices
Microstructure
Pattern analysis
Resists
Shape control
X-ray lithography
title Algorithm for analyzing optimal mask movement pattern in moving mask deep X-ray lithography
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T13%3A24%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Algorithm%20for%20analyzing%20optimal%20mask%20movement%20pattern%20in%20moving%20mask%20deep%20X-ray%20lithography&rft.btitle=Proceedings%20of%202002%20International%20Symposium%20on%20Micromechatronics%20and%20Human%20Science&rft.au=Matsuzuka,%20N.&rft.date=2002&rft.spage=159&rft.epage=164&rft.pages=159-164&rft.isbn=0780376110&rft.isbn_list=9780780376113&rft_id=info:doi/10.1109/MHS.2002.1058027&rft_dat=%3Cieee_6IE%3E1058027%3C/ieee_6IE%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i175t-c7bc59b6b3493076a5a90beb580e61a2c73f2547b9f31adbb2725febf12b1613%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1058027&rfr_iscdi=true