Lithographic approach to pattern multiple nanoparticle thin films prepared by Layer-by-Layer self-assembly for microsystems

We report a lithographic approach to pattern multiple types of Layer-by-Layer self-assembled nanoparticle thin films. 150 nm and 64 nm polystyrene particles are separated in desired patterns with a feature size 5 to 20 microns. The process is quite simple, consisting of only two consecutive lift-off...

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Bibliographic Details
Main Authors: Tianhong Cui, Lvov, Y., Feng Hua, Jingshi Shi
Format: Conference Proceeding
Language:English
Subjects:
Adhesives
Biomedical optical imaging
Lithography
Nanoparticles
Optical device fabrication
Optical films
Optical sensors
Self-assembly
Silicon compounds
Transistors
Online Access:Request full text
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Summary:We report a lithographic approach to pattern multiple types of Layer-by-Layer self-assembled nanoparticle thin films. 150 nm and 64 nm polystyrene particles are separated in desired patterns with a feature size 5 to 20 microns. The process is quite simple, consisting of only two consecutive lift-offs, and there is no high requirement for the equipments. This method can be applied to various types of nanoparticles. Since it is based on the conventional lithographic technique, it provides a simple, reliable, and cheap method for complex microsystem fabrication which is composed mainly of functional nanoparticles for the applications to sensing and actuation in micro/nano scale.
DOI:10.1109/SENSOR.2003.1215579