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Electrical performance and reliability of tunnel magnetoresistance heads for 100-Gb/in/sup 2/ application
Tunnel magnetoresistance (TuMR) heads are attractive candidates for future high-density recording. To achieve the high areal density, it is necessary for TuMR heads to get lower resistance and higher delta R/R film. A low resistance and high delta R/R tunneling junction film has been developed and u...
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Published in: | IEEE transactions on magnetics 2004-01, Vol.40 (1), p.176-181 |
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Main Authors: | , , , , , , , , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
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Summary: | Tunnel magnetoresistance (TuMR) heads are attractive candidates for future high-density recording. To achieve the high areal density, it is necessary for TuMR heads to get lower resistance and higher delta R/R film. A low resistance and high delta R/R tunneling junction film has been developed and used for this study. The resistance area product and delta R/R are 3 /spl Omega//spl middot//spl mu/m/sup 2/ and 18%, respectively. Reliability that includes lifetime was also studied. We have found TuMR heads can be a promising candidate for 100 Gb/in/sup 2/ application. |
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ISSN: | 0018-9464 1941-0069 |
DOI: | 10.1109/TMAG.2003.821203 |