Verification of phase defect correctability of EUV reflective multilayer

In this paper we study the behavior of Mo/Si and Mo/Ru/Si multilayers during a defect correction. The stacking faults of multilayers degraded by uneven diffusion of Si through the Mo grain boundaries.

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Bibliographic Details
Main Authors: Seung Yoon Lee, Tae Geun Kim, Jeong Hoon An, Byung Hee Han, Jea Gun Park, Ji Gon Kim, Chang Woo Lee, Jinho Ahn
Format: Conference Proceeding
Language:English
Subjects:
Annealing
Degradation
Grain boundaries
Heating
Light scattering
Nonhomogeneous media
Optical scattering
Reflectivity
Stacking
Ultraviolet sources
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Description
Summary:In this paper we study the behavior of Mo/Si and Mo/Ru/Si multilayers during a defect correction. The stacking faults of multilayers degraded by uneven diffusion of Si through the Mo grain boundaries.
DOI:10.1109/IMNC.2003.1268532