Fabry-Perot type antireflective coatings for binary mask applications in ArF and F/sub 2/ excimer laser lithographies

We demonstrated an antireflective coating structure based on a Fabry-Perot structure for binary masks of ArF and F/sub 2/ excimer laser lithographies. Reflectance of less than l% at both 193 and 157 nm can be achieved.

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Bibliographic Details
Main Authors: Chen, H.L., Chuang, Y.F., Liu, M.C., Hsieh, C.I., Ko, F.H.
Format: Conference Proceeding
Language:English
Subjects:
Chemical lasers
Coatings
Fabry-Perot
Laser theory
Lithography
Optical films
Reflectivity
Resists
Semiconductor lasers
Writing
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Description
Summary:We demonstrated an antireflective coating structure based on a Fabry-Perot structure for binary masks of ArF and F/sub 2/ excimer laser lithographies. Reflectance of less than l% at both 193 and 157 nm can be achieved.
DOI:10.1109/CLEOPR.2003.1277293