Ultra-high resolution index of refraction profiles of femtosecond laser modified silica structures

Ultra-high spatial resolution index of refraction profiles of femtosecond laser modified structures in silica glass have been measured using the combination of chemical etching and atomic force microscopy.

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Bibliographic Details
Published in:Conference on Lasers and Electro-Optics, 2003. CLEO '03 2003. CLEO '03, 2003-04, Vol.11 (7), p.2 pp.-781
Main Authors: Taylor, R.S., Hnatovsky, C., Simova, E., Rayner, D.M., Bhardwaj, V.R., Corkum, P.B.
Format: Article
Language:English
Subjects:
Atom lasers
Atomic force microscopy
Atomic measurements
Chemical lasers
Etching
Force measurement
Glass
Optical refraction
Silicon compounds
Spatial resolution
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Description
Summary:Ultra-high spatial resolution index of refraction profiles of femtosecond laser modified structures in silica glass have been measured using the combination of chemical etching and atomic force microscopy.
ISSN:1094-4087
1094-4087
DOI:10.1364/OE.11.000775