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A low complexity 0.13 /spl mu/ SiGe BiCMOS technology for wireless and mixed signal applications

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Main Authors: Lanzerotti, L., Feilchenfeld, N., Coolbaugh, D., Slinkman, J., Gray, P., Sheridan, D., Higgins, J., Hodge, W., Gordon, M., Larsen, T., Gautsch, M., Lindgren, P., Murty, R., Rascoe, J., Watson, K., Stamper, T., Eshun, E., He, J., Downes, K., Rassel, R., Greco, J., Labelle, B., Sweeney, S., Stein, K., Bolam, R., Vaed, K., Omer, B., Joseph, A., St Onge, S., Dunn, J.
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creator Lanzerotti, L.
Feilchenfeld, N.
Coolbaugh, D.
Slinkman, J.
Gray, P.
Sheridan, D.
Higgins, J.
Hodge, W.
Gordon, M.
Larsen, T.
Gautsch, M.
Lindgren, P.
Murty, R.
Rascoe, J.
Watson, K.
Stamper, T.
Eshun, E.
He, J.
Downes, K.
Rassel, R.
Greco, J.
Labelle, B.
Sweeney, S.
Stein, K.
Bolam, R.
Vaed, K.
Omer, B.
Joseph, A.
St Onge, S.
Dunn, J.
description
doi_str_mv 10.1109/BIPOL.2004.1365789
format conference_proceeding
fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_1365789</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>1365789</ieee_id><sourcerecordid>1365789</sourcerecordid><originalsourceid>FETCH-ieee_primary_13657893</originalsourceid><addsrcrecordid>eNp9jssKwjAQRQMi-PwB3cwP2Camre1SxRcoFXSvoY46kjahqWj_XheuvZuzOHC4jA0E94TgiT_b7NOtN-Y88ISMwkmcNFiHT2Iu40jEssX6zj34dyGPkmDcZucpaPOCzORW45uqGr4lCb6zGvKnDwdaIcxovksPUGF2L4w2txqupoQXlajROVDFBXJ64wUc3QqlQVmrKVMVmcL1WPOqtMP-j102XC6O8_WIEPFkS8pVWZ9-Z-V_-wGNHkNG</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>A low complexity 0.13 /spl mu/ SiGe BiCMOS technology for wireless and mixed signal applications</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Lanzerotti, L. ; Feilchenfeld, N. ; Coolbaugh, D. ; Slinkman, J. ; Gray, P. ; Sheridan, D. ; Higgins, J. ; Hodge, W. ; Gordon, M. ; Larsen, T. ; Gautsch, M. ; Lindgren, P. ; Murty, R. ; Rascoe, J. ; Watson, K. ; Stamper, T. ; Eshun, E. ; He, J. ; Downes, K. ; Rassel, R. ; Greco, J. ; Labelle, B. ; Sweeney, S. ; Stein, K. ; Bolam, R. ; Vaed, K. ; Omer, B. ; Joseph, A. ; St Onge, S. ; Dunn, J.</creator><creatorcontrib>Lanzerotti, L. ; Feilchenfeld, N. ; Coolbaugh, D. ; Slinkman, J. ; Gray, P. ; Sheridan, D. ; Higgins, J. ; Hodge, W. ; Gordon, M. ; Larsen, T. ; Gautsch, M. ; Lindgren, P. ; Murty, R. ; Rascoe, J. ; Watson, K. ; Stamper, T. ; Eshun, E. ; He, J. ; Downes, K. ; Rassel, R. ; Greco, J. ; Labelle, B. ; Sweeney, S. ; Stein, K. ; Bolam, R. ; Vaed, K. ; Omer, B. ; Joseph, A. ; St Onge, S. ; Dunn, J.</creatorcontrib><identifier>ISBN: 0780386183</identifier><identifier>ISBN: 9780780386181</identifier><identifier>DOI: 10.1109/BIPOL.2004.1365789</identifier><language>eng</language><publisher>IEEE</publisher><subject>BiCMOS integrated circuits ; CMOS technology ; Costs ; Electric breakdown ; FETs ; Foundries ; Germanium silicon alloys ; Implants ; Isolation technology ; Silicon germanium</subject><ispartof>Bipolar/BiCMOS Circuits and Technology, 2004. Proceedings of the 2004 Meeting, 2004, p.237-240</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1365789$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,4050,4051,27925,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1365789$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Lanzerotti, L.</creatorcontrib><creatorcontrib>Feilchenfeld, N.</creatorcontrib><creatorcontrib>Coolbaugh, D.</creatorcontrib><creatorcontrib>Slinkman, J.</creatorcontrib><creatorcontrib>Gray, P.</creatorcontrib><creatorcontrib>Sheridan, D.</creatorcontrib><creatorcontrib>Higgins, J.</creatorcontrib><creatorcontrib>Hodge, W.</creatorcontrib><creatorcontrib>Gordon, M.</creatorcontrib><creatorcontrib>Larsen, T.</creatorcontrib><creatorcontrib>Gautsch, M.</creatorcontrib><creatorcontrib>Lindgren, P.</creatorcontrib><creatorcontrib>Murty, R.</creatorcontrib><creatorcontrib>Rascoe, J.</creatorcontrib><creatorcontrib>Watson, K.</creatorcontrib><creatorcontrib>Stamper, T.</creatorcontrib><creatorcontrib>Eshun, E.</creatorcontrib><creatorcontrib>He, J.</creatorcontrib><creatorcontrib>Downes, K.</creatorcontrib><creatorcontrib>Rassel, R.</creatorcontrib><creatorcontrib>Greco, J.</creatorcontrib><creatorcontrib>Labelle, B.</creatorcontrib><creatorcontrib>Sweeney, S.</creatorcontrib><creatorcontrib>Stein, K.</creatorcontrib><creatorcontrib>Bolam, R.</creatorcontrib><creatorcontrib>Vaed, K.</creatorcontrib><creatorcontrib>Omer, B.</creatorcontrib><creatorcontrib>Joseph, A.</creatorcontrib><creatorcontrib>St Onge, S.</creatorcontrib><creatorcontrib>Dunn, J.</creatorcontrib><title>A low complexity 0.13 /spl mu/ SiGe BiCMOS technology for wireless and mixed signal applications</title><title>Bipolar/BiCMOS Circuits and Technology, 2004. Proceedings of the 2004 Meeting</title><addtitle>BIPOL</addtitle><subject>BiCMOS integrated circuits</subject><subject>CMOS technology</subject><subject>Costs</subject><subject>Electric breakdown</subject><subject>FETs</subject><subject>Foundries</subject><subject>Germanium silicon alloys</subject><subject>Implants</subject><subject>Isolation technology</subject><subject>Silicon germanium</subject><isbn>0780386183</isbn><isbn>9780780386181</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2004</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNp9jssKwjAQRQMi-PwB3cwP2Camre1SxRcoFXSvoY46kjahqWj_XheuvZuzOHC4jA0E94TgiT_b7NOtN-Y88ISMwkmcNFiHT2Iu40jEssX6zj34dyGPkmDcZucpaPOCzORW45uqGr4lCb6zGvKnDwdaIcxovksPUGF2L4w2txqupoQXlajROVDFBXJ64wUc3QqlQVmrKVMVmcL1WPOqtMP-j102XC6O8_WIEPFkS8pVWZ9-Z-V_-wGNHkNG</recordid><startdate>2004</startdate><enddate>2004</enddate><creator>Lanzerotti, L.</creator><creator>Feilchenfeld, N.</creator><creator>Coolbaugh, D.</creator><creator>Slinkman, J.</creator><creator>Gray, P.</creator><creator>Sheridan, D.</creator><creator>Higgins, J.</creator><creator>Hodge, W.</creator><creator>Gordon, M.</creator><creator>Larsen, T.</creator><creator>Gautsch, M.</creator><creator>Lindgren, P.</creator><creator>Murty, R.</creator><creator>Rascoe, J.</creator><creator>Watson, K.</creator><creator>Stamper, T.</creator><creator>Eshun, E.</creator><creator>He, J.</creator><creator>Downes, K.</creator><creator>Rassel, R.</creator><creator>Greco, J.</creator><creator>Labelle, B.</creator><creator>Sweeney, S.</creator><creator>Stein, K.</creator><creator>Bolam, R.</creator><creator>Vaed, K.</creator><creator>Omer, B.</creator><creator>Joseph, A.</creator><creator>St Onge, S.</creator><creator>Dunn, J.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>2004</creationdate><title>A low complexity 0.13 /spl mu/ SiGe BiCMOS technology for wireless and mixed signal applications</title><author>Lanzerotti, L. ; Feilchenfeld, N. ; Coolbaugh, D. ; Slinkman, J. ; Gray, P. ; Sheridan, D. ; Higgins, J. ; Hodge, W. ; Gordon, M. ; Larsen, T. ; Gautsch, M. ; Lindgren, P. ; Murty, R. ; Rascoe, J. ; Watson, K. ; Stamper, T. ; Eshun, E. ; He, J. ; Downes, K. ; Rassel, R. ; Greco, J. ; Labelle, B. ; Sweeney, S. ; Stein, K. ; Bolam, R. ; Vaed, K. ; Omer, B. ; Joseph, A. ; St Onge, S. ; Dunn, J.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-ieee_primary_13657893</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2004</creationdate><topic>BiCMOS integrated circuits</topic><topic>CMOS technology</topic><topic>Costs</topic><topic>Electric breakdown</topic><topic>FETs</topic><topic>Foundries</topic><topic>Germanium silicon alloys</topic><topic>Implants</topic><topic>Isolation technology</topic><topic>Silicon germanium</topic><toplevel>online_resources</toplevel><creatorcontrib>Lanzerotti, L.</creatorcontrib><creatorcontrib>Feilchenfeld, N.</creatorcontrib><creatorcontrib>Coolbaugh, D.</creatorcontrib><creatorcontrib>Slinkman, J.</creatorcontrib><creatorcontrib>Gray, P.</creatorcontrib><creatorcontrib>Sheridan, D.</creatorcontrib><creatorcontrib>Higgins, J.</creatorcontrib><creatorcontrib>Hodge, W.</creatorcontrib><creatorcontrib>Gordon, M.</creatorcontrib><creatorcontrib>Larsen, T.</creatorcontrib><creatorcontrib>Gautsch, M.</creatorcontrib><creatorcontrib>Lindgren, P.</creatorcontrib><creatorcontrib>Murty, R.</creatorcontrib><creatorcontrib>Rascoe, J.</creatorcontrib><creatorcontrib>Watson, K.</creatorcontrib><creatorcontrib>Stamper, T.</creatorcontrib><creatorcontrib>Eshun, E.</creatorcontrib><creatorcontrib>He, J.</creatorcontrib><creatorcontrib>Downes, K.</creatorcontrib><creatorcontrib>Rassel, R.</creatorcontrib><creatorcontrib>Greco, J.</creatorcontrib><creatorcontrib>Labelle, B.</creatorcontrib><creatorcontrib>Sweeney, S.</creatorcontrib><creatorcontrib>Stein, K.</creatorcontrib><creatorcontrib>Bolam, R.</creatorcontrib><creatorcontrib>Vaed, K.</creatorcontrib><creatorcontrib>Omer, B.</creatorcontrib><creatorcontrib>Joseph, A.</creatorcontrib><creatorcontrib>St Onge, S.</creatorcontrib><creatorcontrib>Dunn, J.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Xplore</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Lanzerotti, L.</au><au>Feilchenfeld, N.</au><au>Coolbaugh, D.</au><au>Slinkman, J.</au><au>Gray, P.</au><au>Sheridan, D.</au><au>Higgins, J.</au><au>Hodge, W.</au><au>Gordon, M.</au><au>Larsen, T.</au><au>Gautsch, M.</au><au>Lindgren, P.</au><au>Murty, R.</au><au>Rascoe, J.</au><au>Watson, K.</au><au>Stamper, T.</au><au>Eshun, E.</au><au>He, J.</au><au>Downes, K.</au><au>Rassel, R.</au><au>Greco, J.</au><au>Labelle, B.</au><au>Sweeney, S.</au><au>Stein, K.</au><au>Bolam, R.</au><au>Vaed, K.</au><au>Omer, B.</au><au>Joseph, A.</au><au>St Onge, S.</au><au>Dunn, J.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>A low complexity 0.13 /spl mu/ SiGe BiCMOS technology for wireless and mixed signal applications</atitle><btitle>Bipolar/BiCMOS Circuits and Technology, 2004. Proceedings of the 2004 Meeting</btitle><stitle>BIPOL</stitle><date>2004</date><risdate>2004</risdate><spage>237</spage><epage>240</epage><pages>237-240</pages><isbn>0780386183</isbn><isbn>9780780386181</isbn><pub>IEEE</pub><doi>10.1109/BIPOL.2004.1365789</doi></addata></record>
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identifier ISBN: 0780386183
ispartof Bipolar/BiCMOS Circuits and Technology, 2004. Proceedings of the 2004 Meeting, 2004, p.237-240
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects BiCMOS integrated circuits
CMOS technology
Costs
Electric breakdown
FETs
Foundries
Germanium silicon alloys
Implants
Isolation technology
Silicon germanium
title A low complexity 0.13 /spl mu/ SiGe BiCMOS technology for wireless and mixed signal applications
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T04%3A33%3A43IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=A%20low%20complexity%200.13%20/spl%20mu/%20SiGe%20BiCMOS%20technology%20for%20wireless%20and%20mixed%20signal%20applications&rft.btitle=Bipolar/BiCMOS%20Circuits%20and%20Technology,%202004.%20Proceedings%20of%20the%202004%20Meeting&rft.au=Lanzerotti,%20L.&rft.date=2004&rft.spage=237&rft.epage=240&rft.pages=237-240&rft.isbn=0780386183&rft.isbn_list=9780780386181&rft_id=info:doi/10.1109/BIPOL.2004.1365789&rft_dat=%3Cieee_6IE%3E1365789%3C/ieee_6IE%3E%3Cgrp_id%3Ecdi_FETCH-ieee_primary_13657893%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=1365789&rfr_iscdi=true