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Bulk switching of an amorphous semiconductor
Bulk switching of a Si 3 Ge 4 As 38 Te 55 amorphous semiconductor is reported. Even though the contacts are separated by 1 mm, a delay time of only 10 µs is observed. This is attributed to an active region of only 0.1-mm thickness near the positive electrode. The threshold voltage is 250 volts at ro...
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Published in: | Proceedings of the IEEE 1970-01, Vol.58 (11), p.1852-1852 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that cite this one |
Online Access: | Get full text |
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Summary: | Bulk switching of a Si 3 Ge 4 As 38 Te 55 amorphous semiconductor is reported. Even though the contacts are separated by 1 mm, a delay time of only 10 µs is observed. This is attributed to an active region of only 0.1-mm thickness near the positive electrode. The threshold voltage is 250 volts at room temperature. |
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ISSN: | 0018-9219 1558-2256 |
DOI: | 10.1109/PROC.1970.8035 |