Nanochannels for DNA stretching fabricated by standard cleanroom processing and nanoimprint lithography

An inexpensive method compared to e-beam lithography for the fabrication of nm-sized structures is presented. 30 nm wide knife-edge stamps are used to pattern a polymer film on a silicon substrate by nanoimprint lithography (NIL) [I]. The patterned polymer film with a feature size down to 30 nm can...

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Bibliographic Details
Main Authors: Bilenberg, B., Pastore, C., Nielsen, T., Enghoff, S.R., Jeppesen, C., Larsen, A.V., Kristensen, A.
Format: Conference Proceeding
Language:English
Subjects:
DNA
Etching
Fabrication
Lab-on-a-chip
Nanolithography
Oxidation
Polymer films
Resists
Silicon
Substrates
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Summary:An inexpensive method compared to e-beam lithography for the fabrication of nm-sized structures is presented. 30 nm wide knife-edge stamps are used to pattern a polymer film on a silicon substrate by nanoimprint lithography (NIL) [I]. The patterned polymer film with a feature size down to 30 nm can subsequently be used either as a metal lift-off mask or, as a direct etching mask to fabricate nm-sized grooves in the silicon substrate. This way we demonstrate the fabrication of sub-1 00 nm nanochannels for DNA analysis on lab-on-a-chip micro systems [2, 31.
DOI:10.1109/IMNC.2004.245760