Novel evaluation system for EUV resist in NewSUBARU

A novel system for evaluation of EUV resist was installed at BL3 beamline in NewSUBARU synchrotron radiation facility. This system consists of an optics chamber, an exposure chamber and a sample loadlock chamber. Each chamber has a vacuum system of turbo molecular pump and scroll pump. In the exposu...

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Bibliographic Details
Main Authors: Seung Yoon Lee, Watanabe, T., Kinoshita, H., Sakaya, N., Shoki, T.
Format: Conference Proceeding
Language:English
Subjects:
Chemicals
Mirrors
Nonhomogeneous media
Optical pumping
Optical reflection
Optical sensors
Optical surface waves
Particle beam optics
Resists
Ultraviolet sources
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Summary:A novel system for evaluation of EUV resist was installed at BL3 beamline in NewSUBARU synchrotron radiation facility. This system consists of an optics chamber, an exposure chamber and a sample loadlock chamber. Each chamber has a vacuum system of turbo molecular pump and scroll pump. In the exposure chamber, a high sensitive quadruple mass spectrometer (Model HAL/3F/PIC 501 RC, HIDEN ANALYTICAL Ltd.) which can measure mass number from 1 to 500 of ion species, is used for resist outgassing analysis under EUV irradiation. The main purpose of this whole system is to evaluate the basic physical and chemical properties of various EUV resists candidates, such as sensitivity, outgas characteristics, and internal chemical behavior.
DOI:10.1109/IMNC.2004.245657