Optimization of extension doping technology for roll-off suppression of industrial 0.1-um pMOSFETs

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Bibliographic Details
Main Authors: Lenoble, D., Josse, E., Grouillet, A., Julien, C., Skotnicki, T., Walther, S., Liebert, R.B.
Format: Conference Proceeding
Language:English
Subjects:
Atomic measurements
Boron
CMOS technology
Communication industry
Doping
Fabrication
Ion beams
Ion implantation
MOSFETs
Sea measurements
Online Access:Request full text
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DOI:10.1109/ESSDERC.2000.194799