Structure and Memory Effects of Low Energy Ge-Implanted Thin SiO2 Films

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Bibliographic Details
Main Authors: Kapetanakis, E., Normand, P., Tsoukalas, D., Beltsios, K., Travlos, T., Gautier, J., Palun, L., Jourdan, F.
Format: Conference Proceeding
Language:English
Subjects:
Amorphous materials
Annealing
Capacitance-voltage characteristics
Capacitors
Electron traps
Glass
Material storage
Temperature
Transmission electron microscopy
Voltage
Online Access:Request full text
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