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Trimming of silicon nitride microring resonators with a polysilane top cladding

We demonstrate 23.5 nm shifts of Si/sub 3/N/sub 4/ microring resonances by exposing a polysilane cladding layer to UV light. Our PECVD polysilane cladding is superior to other approaches, because it is insoluble, demonstrates good stability, and exhibits /spl sim/4% index shift.

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Bibliographic Details
Main Authors: Sparacin, D.K., Lock, J.P., Ching-yin Hong, Gleason, K.K., Kimerling, L.C., Michel, J.
Format: Conference Proceeding
Language:English
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Description
Summary:We demonstrate 23.5 nm shifts of Si/sub 3/N/sub 4/ microring resonances by exposing a polysilane cladding layer to UV light. Our PECVD polysilane cladding is superior to other approaches, because it is insoluble, demonstrates good stability, and exhibits /spl sim/4% index shift.
ISSN:1949-2081
1949-209X
DOI:10.1109/GROUP4.2005.1516423