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Trimming of silicon nitride microring resonators with a polysilane top cladding
We demonstrate 23.5 nm shifts of Si/sub 3/N/sub 4/ microring resonances by exposing a polysilane cladding layer to UV light. Our PECVD polysilane cladding is superior to other approaches, because it is insoluble, demonstrates good stability, and exhibits /spl sim/4% index shift.
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Main Authors: | , , , , , |
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Format: | Conference Proceeding |
Language: | English |
Subjects: | |
Online Access: | Request full text |
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Summary: | We demonstrate 23.5 nm shifts of Si/sub 3/N/sub 4/ microring resonances by exposing a polysilane cladding layer to UV light. Our PECVD polysilane cladding is superior to other approaches, because it is insoluble, demonstrates good stability, and exhibits /spl sim/4% index shift. |
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ISSN: | 1949-2081 1949-209X |
DOI: | 10.1109/GROUP4.2005.1516423 |