MOCVD process modeling using in-situ reflectance test structure measurements for process control improvement

Process control methodology based on in-situ reflectance measurements can be used with a process model to reduce calibration runs in the development and manufacture of InGaAlAs lasers and modulators.

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Bibliographic Details
Main Authors: Ebert, C., Bond, A., Levkoff, J., Seiler, J., Wanamaker, C.
Format: Conference Proceeding
Language:English
Subjects:
Composite materials
Gallium arsenide
Indium phosphide
Inductors
MOCVD
Optical feedback
Optical materials
Process control
Reflectivity
Testing
Online Access:Request full text
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Description
Summary:Process control methodology based on in-situ reflectance measurements can be used with a process model to reduce calibration runs in the development and manufacture of InGaAlAs lasers and modulators.
ISSN:1092-8669
DOI:10.1109/ICIPRM.2005.1517461