MOCVD process modeling using in-situ reflectance test structure measurements for process control improvement

Process control methodology based on in-situ reflectance measurements can be used with a process model to reduce calibration runs in the development and manufacture of InGaAlAs lasers and modulators.

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Main Authors: Ebert, C., Bond, A., Levkoff, J., Seiler, J., Wanamaker, C.
Format: Conference Proceeding
Language:English
Subjects:
Composite materials
Gallium arsenide
Indium phosphide
Inductors
MOCVD
Optical feedback
Optical materials
Process control
Reflectivity
Testing
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creator Ebert, C.
Bond, A.
Levkoff, J.
Seiler, J.
Wanamaker, C.
description Process control methodology based on in-situ reflectance measurements can be used with a process model to reduce calibration runs in the development and manufacture of InGaAlAs lasers and modulators.
doi_str_mv 10.1109/ICIPRM.2005.1517461
format conference_proceeding
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ispartof International Conference on Indium Phosphide and Related Materials, 2005, 2005, p.219-222
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Composite materials
Gallium arsenide
Indium phosphide
Inductors
MOCVD
Optical feedback
Optical materials
Process control
Reflectivity
Testing
title MOCVD process modeling using in-situ reflectance test structure measurements for process control improvement
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