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Amorphous Ge bipolar blocking contacts on Ge detectors
The authors report on the performance of high-purity Ge radiation detectors with amorphous Ge (a-Ge) contacts fabricated using RF sputtering techniques. Electrical contacts formed using sputtered a-Ge films on high-purity Ge crystals, both n- and p-type, were found to exhibit good blocking behavior...
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Published in: | IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) 1992-08, Vol.39 (4), p.590-594 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The authors report on the performance of high-purity Ge radiation detectors with amorphous Ge (a-Ge) contacts fabricated using RF sputtering techniques. Electrical contacts formed using sputtered a-Ge films on high-purity Ge crystals, both n- and p-type, were found to exhibit good blocking behavior with low leakage currents, with the contact biased under either voltage polarity. The a-Ge contacts have thin dead layers associated with them, and can be used in place of lithium-diffused, ion-implanted, or Schottky barrier contacts on Ge radiation detectors. The use of such contacts allows fabrication of multi-electrode detectors by means of simple processing steps.< > |
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ISSN: | 0018-9499 1558-1578 |
DOI: | 10.1109/23.159670 |