X-ray lithography-an overview

The fundamentals of X-ray lithography are reviewed. Issues associated with resolution, wafer throughput, and process latitude are discussed. X-ray lithography is compared with other lithographic technologies; future advancements, such as X-ray projection lithography, are described. It is shown that...

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Bibliographic Details
Published in:Proceedings of the IEEE 1993-09, Vol.81 (9), p.1249-1274
Main Authors: Peckerar, M.C., Maldonado, J.R.
Format: Article
Language:English
Subjects:
Applied sciences
Circuit synthesis
Costs
Electronics
Exact sciences and technology
Image resolution
Manufacturing
Microelectronic fabrication (materials and surfaces technology)
Production
Prototypes
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Silicon
Throughput
X-ray imaging
X-ray lithography
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Summary:The fundamentals of X-ray lithography are reviewed. Issues associated with resolution, wafer throughput, and process latitude are discussed. X-ray lithography is compared with other lithographic technologies; future advancements, such as X-ray projection lithography, are described. It is shown that the major barrier to the near-term success for X-ray lithography is the requirement for a defect-free one-to-one mask which satisfies the stringent image-placement needs of submicrometer patterning.< >
ISSN:0018-9219
1558-2256
DOI:10.1109/5.237534