Lead titanate thin films deposited by metallorganic chemical vapor deposition (MOCVD)

Highly transparent lead titanate (PbTiO/sub 3/) thin films were deposited on both platinum-coated silicon wafers and sapphire disks. The results were characterized using XRD (X-ray diffraction) to determine the phases present and the presence of preferred orientation. SEM (scanning electron microsco...

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Bibliographic Details
Main Authors: Hendricks, W.C., Peng, C.H., Desu, S.B.
Format: Conference Proceeding
Language:English
Subjects:
Chemicals
Lead
Morphology
Optical films
Scanning electron microscopy
Semiconductor thin films
Silicon
Sputtering
Titanium compounds
X-ray scattering
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Description
Summary:Highly transparent lead titanate (PbTiO/sub 3/) thin films were deposited on both platinum-coated silicon wafers and sapphire disks. The results were characterized using XRD (X-ray diffraction) to determine the phases present and the presence of preferred orientation. SEM (scanning electron microscopy) was used to examine the morphology of both the surface and the cross-section. UV-VIS-NIR (ultraviolet, visible, near infrared) spectrophotometry was used to determine the dispersion relationship and the optical band gap energy. XRD revealed a nonoriented film on sapphire while the film on the platinum substrate was preferably oriented in the
DOI:10.1109/ISAF.1992.300690