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Deep-submicron structures in YBCO: fabrication and measurements
We present a fabrication method that consistently produces superconducting structures with lateral dimensions down to 100 nm. The etching is done in a Distributed Electron Cyclotron (ECR-) etcher using a plasma of argon and oxygen. The sample is water cooled. Degradation of the etched structures is...
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Published in: | IEEE transactions on applied superconductivity 1995-06, Vol.5 (2), p.1448-1451 |
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container_end_page | 1451 |
container_issue | 2 |
container_start_page | 1448 |
container_title | IEEE transactions on applied superconductivity |
container_volume | 5 |
creator | van der Harg, A.J.M. van der Drift, E. Hadley, P. |
description | We present a fabrication method that consistently produces superconducting structures with lateral dimensions down to 100 nm. The etching is done in a Distributed Electron Cyclotron (ECR-) etcher using a plasma of argon and oxygen. The sample is water cooled. Degradation of the etched structures is very limited. We discuss electrical measurements on long, narrow lines and constrictions.< > |
doi_str_mv | 10.1109/77.402838 |
format | article |
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We discuss electrical measurements on long, narrow lines and constrictions.< ></description><subject>Argon</subject><subject>Cyclotrons</subject><subject>Degradation</subject><subject>Electric variables measurement</subject><subject>Electrons</subject><subject>Etching</subject><subject>Fabrication</subject><subject>Plasma applications</subject><subject>Plasma measurements</subject><subject>Yttrium barium copper oxide</subject><issn>1051-8223</issn><issn>1558-2515</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNo9jztLxEAUhQdRcF0tbK3SWsw6z9wbG9H4hIVttLAKk8kdGDFxmUkK_71ZdrE6F87H5XyMXUqxklJUNwArIxRqPGILaS1yZaU9nm9hJUel9Ck7y_lLCGnQ2AW7eyTa8jy1ffTpZyjymCY_TolyEYfi86He3BbBtSl6N8a5d0NX9OTyTPQ0jPmcnQT3nenikEv28fz0Xr_y9eblrb5fc69Qjtw7ZVQIBLo1WMkSqANZkmg1EgR0CJU12neKFJQI3mLpjQggZqm2NEEv2fX-77wy50Sh2abYu_TbSNHszBuAZm8-s1d7NhLRP3co_wB21FKm</recordid><startdate>19950601</startdate><enddate>19950601</enddate><creator>van der Harg, A.J.M.</creator><creator>van der Drift, E.</creator><creator>Hadley, P.</creator><general>IEEE</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>19950601</creationdate><title>Deep-submicron structures in YBCO: fabrication and measurements</title><author>van der Harg, A.J.M. ; van der Drift, E. ; Hadley, P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c281t-ca242ffe73b489167ed716e0b38e7f8a879543cd2e27687c586c40f70110b64f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><topic>Argon</topic><topic>Cyclotrons</topic><topic>Degradation</topic><topic>Electric variables measurement</topic><topic>Electrons</topic><topic>Etching</topic><topic>Fabrication</topic><topic>Plasma applications</topic><topic>Plasma measurements</topic><topic>Yttrium barium copper oxide</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>van der Harg, A.J.M.</creatorcontrib><creatorcontrib>van der Drift, E.</creatorcontrib><creatorcontrib>Hadley, P.</creatorcontrib><collection>CrossRef</collection><jtitle>IEEE transactions on applied superconductivity</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>van der Harg, A.J.M.</au><au>van der Drift, E.</au><au>Hadley, P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deep-submicron structures in YBCO: fabrication and measurements</atitle><jtitle>IEEE transactions on applied superconductivity</jtitle><stitle>TASC</stitle><date>1995-06-01</date><risdate>1995</risdate><volume>5</volume><issue>2</issue><spage>1448</spage><epage>1451</epage><pages>1448-1451</pages><issn>1051-8223</issn><eissn>1558-2515</eissn><coden>ITASE9</coden><abstract>We present a fabrication method that consistently produces superconducting structures with lateral dimensions down to 100 nm. The etching is done in a Distributed Electron Cyclotron (ECR-) etcher using a plasma of argon and oxygen. The sample is water cooled. Degradation of the etched structures is very limited. We discuss electrical measurements on long, narrow lines and constrictions.< ></abstract><pub>IEEE</pub><doi>10.1109/77.402838</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
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source | IEEE Electronic Library (IEL) Journals |
subjects | Argon Cyclotrons Degradation Electric variables measurement Electrons Etching Fabrication Plasma applications Plasma measurements Yttrium barium copper oxide |
title | Deep-submicron structures in YBCO: fabrication and measurements |
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