Nano-scale ablation with a compact extreme ultraviolet laser

In this work we demonstrate the feasibility of directly ablating sub-100 nm holes using the focused extreme ultraviolet (EUV) wavelength output from a compact lambda=46.9 nm capillary discharge laser. These results demonstrate the feasibility of sub-100 nm patterning of materials with a focused extr...

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Bibliographic Details
Main Authors: Menoni, C.S., Vaschenko, G., Bravo, H., Brizuela, F., Rocca, J.J., Chao, W., Anderson, E.H., Attwood, D.T., Hemberg, O., Frazer, B., Bloom, S.
Format: Conference Proceeding
Language:English
Subjects:
Argon
Diffraction
Focusing
Laser ablation
Laser beams
Laser theory
Optical attenuators
Surface emitting lasers
Ultraviolet sources
X-ray lasers
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Summary:In this work we demonstrate the feasibility of directly ablating sub-100 nm holes using the focused extreme ultraviolet (EUV) wavelength output from a compact lambda=46.9 nm capillary discharge laser. These results demonstrate the feasibility of sub-100 nm patterning of materials with a focused extreme ultraviolet laser beam, opening a path for the development of new nanoprobes and nano-machining tools
ISSN:1092-8081
2766-1733
DOI:10.1109/LEOS.2006.279183