Novel Methods of Fabrication and Metrology of Superconducting NanoStructures

As metrology extends toward the nanoscale, a number of potential applications and new challenges arise. By combining photolithography with focused ion beam and/or electron beam methods, superconducting quantum interference devices (SQUIDs) with loop dimensions down to 200 nm and superconducting brid...

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Bibliographic Details
Published in:IEEE transactions on instrumentation and measurement 2007-04, Vol.56 (2), p.392-396
Main Authors: Hao, Ling, Macfarlane, John C., Gallop, John C., Cox, David, Joseph-Franks, Patrick, Hutson, David, Chen, Jie, Lam, S. K. H.
Format: Article
Language:English
Subjects:
Bridges
Electron beams
Fabrication
Interference
Ion beams
Lithography
Magnetic field effects
Metrology
Nanocomposites
Nanomaterials
Nanostructure
Nanostructures
nanotechnology
Penetration depth
SQUIDs
Superconducting devices
Superconducting quantum interference devices
Superconductivity
thin films
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Description
Summary:As metrology extends toward the nanoscale, a number of potential applications and new challenges arise. By combining photolithography with focused ion beam and/or electron beam methods, superconducting quantum interference devices (SQUIDs) with loop dimensions down to 200 nm and superconducting bridge dimensions of the order 80 nm have been produced. These SQUIDs have a range of potential applications. As an illustration, we describe a method for characterizing the effective area and the magnetic penetration depth of a structured superconducting thin film in the extreme limit, where the superconducting penetration depth \lambda is much greater than the film thickness and is comparable with the lateral dimensions of the device.
ISSN:0018-9456
1557-9662
DOI:10.1109/TIM.2007.890593