A Formation of Si Native Oxide Membrane Using High-Selectivity Etching and Applications for Nano-Pipe Array and Micro-Diaphragm on Si Substrate

A novel technique in creating a cavity by using a membrane of Si-native oxide has been developed. The membrane of Si-native oxide was formed by high-selectivity Cl 2 etching of Si which surface was treated by wet chemicals. Following film deposition onto the membrane which was supported by SiO 2 mas...

Full description

Saved in:
Bibliographic Details
Main Authors: Sugino, R., Ito, T.
Format: Conference Proceeding
Language:English
Subjects:
Biomembranes
Chemicals
Resists
Scanning electron microscopy
Semiconductor films
Substrates
Surface treatment
Temperature
Visualization
Wet etching
Online Access:Request full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A novel technique in creating a cavity by using a membrane of Si-native oxide has been developed. The membrane of Si-native oxide was formed by high-selectivity Cl 2 etching of Si which surface was treated by wet chemicals. Following film deposition onto the membrane which was supported by SiO 2 mask can make a cavity in the substrate. The advantage of this technique is its ability to maintain the CD of cavity even after film deposition to seal the via-opening
ISSN:0163-1918
2156-017X
DOI:10.1109/IEDM.2006.346831