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Performances of GeSnSbTe Material for High-Speed Phase Change Memory

In this paper, a new application of phase change material GeSnSbTe (GSST) is proposed for high-speed phase-change memory (PCM). The device characteristics of PCM employing GeSnSbTe and conventional Ge 2 Sb 2 Te 5 (GST) are compared. Because of high crystallization speed, the GSST device demonstrates...

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Main Authors: Chain-Ming Lee, Der-Sheng Chao, Yi-Chan Chen, Ming-Jung Chen, Yen, P.H., Chih-Wei Chen, Hong-Hui Hsu, Wen-Han Wang, Wei-Su Chen, Chen, F., Tsai-Chu Hsiao, Ming-Jer Kao, Ming-Jinn Tsai
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creator Chain-Ming Lee
Der-Sheng Chao
Yi-Chan Chen
Ming-Jung Chen
Yen, P.H.
Chih-Wei Chen
Hong-Hui Hsu
Wen-Han Wang
Wei-Su Chen
Chen, F.
Tsai-Chu Hsiao
Ming-Jer Kao
Ming-Jinn Tsai
description In this paper, a new application of phase change material GeSnSbTe (GSST) is proposed for high-speed phase-change memory (PCM). The device characteristics of PCM employing GeSnSbTe and conventional Ge 2 Sb 2 Te 5 (GST) are compared. Because of high crystallization speed, the GSST device demonstrates the benefits of shorter SET pulse, lower SET current, and higher resistance ratio.
doi_str_mv 10.1109/VTSA.2007.378936
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identifier ISSN: 1524-766X
ispartof 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA), 2007, p.1-2
issn 1524-766X
2690-8174
language eng ; jpn
recordid cdi_ieee_primary_4239504
source IEEE Electronic Library (IEL) Conference Proceedings
subjects Crystallization
Doping
Electrical resistance measurement
Nonvolatile memory
Optical pulses
Phase change materials
Phase change memory
Space vector pulse width modulation
Testing
Voltage
title Performances of GeSnSbTe Material for High-Speed Phase Change Memory
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