Moving Carefully Towards Model-based Layout Optimization and Checking

IBM has taken several steps in developing an analysis and optimization framework for VLSI layouts. We have deployed automated tools to reduce the sensitivity of designs to certain defect mechanisms in the manufacturing process. We see a clear need for expanding and refining tMs work and then integra...

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Bibliographic Details
Main Authors: Hibbeler, J.D., Maynard, D.N.
Format: Conference Proceeding
Language:English
Subjects:
Design optimization
Libraries
Manufacturing industries
Manufacturing processes
Microprocessors
Production
Semiconductor device manufacture
Space technology
Very large scale integration
Virtual manufacturing
Online Access:Request full text
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Description
Summary:IBM has taken several steps in developing an analysis and optimization framework for VLSI layouts. We have deployed automated tools to reduce the sensitivity of designs to certain defect mechanisms in the manufacturing process. We see a clear need for expanding and refining tMs work and then integrating it with rigorous characterization of manufacturing processes and at the same time developing and integrating an overall trade-off theory showing the interaction of different layout-based yield-enhancement actions.
ISSN:1078-8743
2376-6697
DOI:10.1109/ASMC.2007.375074