Implementation of Polycrystalline X-Ray Diffraction for Semiconductor Metrology

This paper describes the implementation of a first generation inline X-ray diffractometer for the characterization of polycrystalline thin films. The tool is able to provide quantitative structural data on either blanket or patterned wafers, which allows it to serve as a routine line monitor, or as...

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Bibliographic Details
Main Authors: DeHaven, P.W., Jeanneret, M., Gittleman, B., Kozaczek, K.
Format: Conference Proceeding
Language:English
Subjects:
Crystalline materials
Crystallization
Detectors
Grain size
Metrology
Monitoring
Probes
Structural beams
X-ray diffraction
X-ray scattering
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Description
Summary:This paper describes the implementation of a first generation inline X-ray diffractometer for the characterization of polycrystalline thin films. The tool is able to provide quantitative structural data on either blanket or patterned wafers, which allows it to serve as a routine line monitor, or as an analytical probe for process development, tool matching, or problem diagnostics.
ISSN:1078-8743
2376-6697
DOI:10.1109/ASMC.2007.375106