Loading…

Degradation-Mode Analysis for Highly Reliable GaN-HEMT

We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degra...

Full description

Saved in:
Bibliographic Details
Main Authors: Inoue, Y., Masuda, S., Kanamura, M., Ohki, T., Makiyama, K., Okamoto, N., Imanishi, K., Kikkawa, T., Hara, N., Shigematsu, H., Joshin, K.
Format: Conference Proceeding
Language:English
Subjects:
Online Access:Request full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by
cites
container_end_page 642
container_issue
container_start_page 639
container_title
container_volume
creator Inoue, Y.
Masuda, S.
Kanamura, M.
Ohki, T.
Makiyama, K.
Okamoto, N.
Imanishi, K.
Kikkawa, T.
Hara, N.
Shigematsu, H.
Joshin, K.
description We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degradation. We also discussed the gate leakage current factor, for example, the surface hexagonal pits. Using this eliminating method, we could select the reliable devices with a life of over 1 times 10 6 hours at high-temperature of 200degC.
doi_str_mv 10.1109/MWSYM.2007.379982
format conference_proceeding
fullrecord <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_4263897</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>4263897</ieee_id><sourcerecordid>4263897</sourcerecordid><originalsourceid>FETCH-LOGICAL-g145t-6670b0955f71f48095d9d54f3859f60d126175a219db85293520e0930ea3c7073</originalsourceid><addsrcrecordid>eNpFjMtKw0AUQMcXGGs_QNzkBybeO687syy1NkKjoBV1VSbOJI7EVpJu8vcKCq7OgQOHsQuEAhHcVfX8-FoVAoAKSc5ZccDOUAmlwFjrDlkmNBlOAs3RfyA4Zhmgctwo_XLKpsPwAQBIRiFRxsx1bHsf_D7ttrzahZjPtr4bhzTkza7Py9S-d2P-ELvk6y7mS3_Hy0W1Pmcnje-GOP3jhD3dLNbzkq_ul7fz2Yq3qPSeG0NQg9O6IWyU_bHgglaNtNo1BgIKg6S9QBdqq4WTWkAEJyF6-UZAcsIuf78pxrj56tOn78eNEkZaR_IbFedHPQ</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Degradation-Mode Analysis for Highly Reliable GaN-HEMT</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Inoue, Y. ; Masuda, S. ; Kanamura, M. ; Ohki, T. ; Makiyama, K. ; Okamoto, N. ; Imanishi, K. ; Kikkawa, T. ; Hara, N. ; Shigematsu, H. ; Joshin, K.</creator><creatorcontrib>Inoue, Y. ; Masuda, S. ; Kanamura, M. ; Ohki, T. ; Makiyama, K. ; Okamoto, N. ; Imanishi, K. ; Kikkawa, T. ; Hara, N. ; Shigematsu, H. ; Joshin, K.</creatorcontrib><description>We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degradation. We also discussed the gate leakage current factor, for example, the surface hexagonal pits. Using this eliminating method, we could select the reliable devices with a life of over 1 times 10 6 hours at high-temperature of 200degC.</description><identifier>ISSN: 0149-645X</identifier><identifier>ISBN: 1424406870</identifier><identifier>ISBN: 9781424406876</identifier><identifier>EISSN: 2576-7216</identifier><identifier>EISBN: 1424406889</identifier><identifier>EISBN: 9781424406883</identifier><identifier>DOI: 10.1109/MWSYM.2007.379982</identifier><language>eng</language><publisher>IEEE</publisher><subject>Aluminum gallium nitride ; Current measurement ; Degradation ; Laboratories ; Leakage current ; Mobile handsets ; Stress measurement ; Temperature ; Testing ; Wireless LAN</subject><ispartof>2007 IEEE/MTT-S International Microwave Symposium, 2007, p.639-642</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4263897$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,27925,54555,54920,54932</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4263897$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Inoue, Y.</creatorcontrib><creatorcontrib>Masuda, S.</creatorcontrib><creatorcontrib>Kanamura, M.</creatorcontrib><creatorcontrib>Ohki, T.</creatorcontrib><creatorcontrib>Makiyama, K.</creatorcontrib><creatorcontrib>Okamoto, N.</creatorcontrib><creatorcontrib>Imanishi, K.</creatorcontrib><creatorcontrib>Kikkawa, T.</creatorcontrib><creatorcontrib>Hara, N.</creatorcontrib><creatorcontrib>Shigematsu, H.</creatorcontrib><creatorcontrib>Joshin, K.</creatorcontrib><title>Degradation-Mode Analysis for Highly Reliable GaN-HEMT</title><title>2007 IEEE/MTT-S International Microwave Symposium</title><addtitle>MWSYM</addtitle><description>We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degradation. We also discussed the gate leakage current factor, for example, the surface hexagonal pits. Using this eliminating method, we could select the reliable devices with a life of over 1 times 10 6 hours at high-temperature of 200degC.</description><subject>Aluminum gallium nitride</subject><subject>Current measurement</subject><subject>Degradation</subject><subject>Laboratories</subject><subject>Leakage current</subject><subject>Mobile handsets</subject><subject>Stress measurement</subject><subject>Temperature</subject><subject>Testing</subject><subject>Wireless LAN</subject><issn>0149-645X</issn><issn>2576-7216</issn><isbn>1424406870</isbn><isbn>9781424406876</isbn><isbn>1424406889</isbn><isbn>9781424406883</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2007</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNpFjMtKw0AUQMcXGGs_QNzkBybeO687syy1NkKjoBV1VSbOJI7EVpJu8vcKCq7OgQOHsQuEAhHcVfX8-FoVAoAKSc5ZccDOUAmlwFjrDlkmNBlOAs3RfyA4Zhmgctwo_XLKpsPwAQBIRiFRxsx1bHsf_D7ttrzahZjPtr4bhzTkza7Py9S-d2P-ELvk6y7mS3_Hy0W1Pmcnje-GOP3jhD3dLNbzkq_ul7fz2Yq3qPSeG0NQg9O6IWyU_bHgglaNtNo1BgIKg6S9QBdqq4WTWkAEJyF6-UZAcsIuf78pxrj56tOn78eNEkZaR_IbFedHPQ</recordid><startdate>200706</startdate><enddate>200706</enddate><creator>Inoue, Y.</creator><creator>Masuda, S.</creator><creator>Kanamura, M.</creator><creator>Ohki, T.</creator><creator>Makiyama, K.</creator><creator>Okamoto, N.</creator><creator>Imanishi, K.</creator><creator>Kikkawa, T.</creator><creator>Hara, N.</creator><creator>Shigematsu, H.</creator><creator>Joshin, K.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>200706</creationdate><title>Degradation-Mode Analysis for Highly Reliable GaN-HEMT</title><author>Inoue, Y. ; Masuda, S. ; Kanamura, M. ; Ohki, T. ; Makiyama, K. ; Okamoto, N. ; Imanishi, K. ; Kikkawa, T. ; Hara, N. ; Shigematsu, H. ; Joshin, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-g145t-6670b0955f71f48095d9d54f3859f60d126175a219db85293520e0930ea3c7073</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Aluminum gallium nitride</topic><topic>Current measurement</topic><topic>Degradation</topic><topic>Laboratories</topic><topic>Leakage current</topic><topic>Mobile handsets</topic><topic>Stress measurement</topic><topic>Temperature</topic><topic>Testing</topic><topic>Wireless LAN</topic><toplevel>online_resources</toplevel><creatorcontrib>Inoue, Y.</creatorcontrib><creatorcontrib>Masuda, S.</creatorcontrib><creatorcontrib>Kanamura, M.</creatorcontrib><creatorcontrib>Ohki, T.</creatorcontrib><creatorcontrib>Makiyama, K.</creatorcontrib><creatorcontrib>Okamoto, N.</creatorcontrib><creatorcontrib>Imanishi, K.</creatorcontrib><creatorcontrib>Kikkawa, T.</creatorcontrib><creatorcontrib>Hara, N.</creatorcontrib><creatorcontrib>Shigematsu, H.</creatorcontrib><creatorcontrib>Joshin, K.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Inoue, Y.</au><au>Masuda, S.</au><au>Kanamura, M.</au><au>Ohki, T.</au><au>Makiyama, K.</au><au>Okamoto, N.</au><au>Imanishi, K.</au><au>Kikkawa, T.</au><au>Hara, N.</au><au>Shigematsu, H.</au><au>Joshin, K.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Degradation-Mode Analysis for Highly Reliable GaN-HEMT</atitle><btitle>2007 IEEE/MTT-S International Microwave Symposium</btitle><stitle>MWSYM</stitle><date>2007-06</date><risdate>2007</risdate><spage>639</spage><epage>642</epage><pages>639-642</pages><issn>0149-645X</issn><eissn>2576-7216</eissn><isbn>1424406870</isbn><isbn>9781424406876</isbn><eisbn>1424406889</eisbn><eisbn>9781424406883</eisbn><abstract>We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degradation. We also discussed the gate leakage current factor, for example, the surface hexagonal pits. Using this eliminating method, we could select the reliable devices with a life of over 1 times 10 6 hours at high-temperature of 200degC.</abstract><pub>IEEE</pub><doi>10.1109/MWSYM.2007.379982</doi><tpages>4</tpages></addata></record>
fulltext fulltext_linktorsrc
identifier ISSN: 0149-645X
ispartof 2007 IEEE/MTT-S International Microwave Symposium, 2007, p.639-642
issn 0149-645X
2576-7216
language eng
recordid cdi_ieee_primary_4263897
source IEEE Electronic Library (IEL) Conference Proceedings
subjects Aluminum gallium nitride
Current measurement
Degradation
Laboratories
Leakage current
Mobile handsets
Stress measurement
Temperature
Testing
Wireless LAN
title Degradation-Mode Analysis for Highly Reliable GaN-HEMT
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T10%3A44%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Degradation-Mode%20Analysis%20for%20Highly%20Reliable%20GaN-HEMT&rft.btitle=2007%20IEEE/MTT-S%20International%20Microwave%20Symposium&rft.au=Inoue,%20Y.&rft.date=2007-06&rft.spage=639&rft.epage=642&rft.pages=639-642&rft.issn=0149-645X&rft.eissn=2576-7216&rft.isbn=1424406870&rft.isbn_list=9781424406876&rft_id=info:doi/10.1109/MWSYM.2007.379982&rft.eisbn=1424406889&rft.eisbn_list=9781424406883&rft_dat=%3Cieee_6IE%3E4263897%3C/ieee_6IE%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-g145t-6670b0955f71f48095d9d54f3859f60d126175a219db85293520e0930ea3c7073%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=4263897&rfr_iscdi=true