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Degradation-Mode Analysis for Highly Reliable GaN-HEMT
We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degra...
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creator | Inoue, Y. Masuda, S. Kanamura, M. Ohki, T. Makiyama, K. Okamoto, N. Imanishi, K. Kikkawa, T. Hara, N. Shigematsu, H. Joshin, K. |
description | We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degradation. We also discussed the gate leakage current factor, for example, the surface hexagonal pits. Using this eliminating method, we could select the reliable devices with a life of over 1 times 10 6 hours at high-temperature of 200degC. |
doi_str_mv | 10.1109/MWSYM.2007.379982 |
format | conference_proceeding |
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Using this eliminating method, we could select the reliable devices with a life of over 1 times 10 6 hours at high-temperature of 200degC.</description><identifier>ISSN: 0149-645X</identifier><identifier>ISBN: 1424406870</identifier><identifier>ISBN: 9781424406876</identifier><identifier>EISSN: 2576-7216</identifier><identifier>EISBN: 1424406889</identifier><identifier>EISBN: 9781424406883</identifier><identifier>DOI: 10.1109/MWSYM.2007.379982</identifier><language>eng</language><publisher>IEEE</publisher><subject>Aluminum gallium nitride ; Current measurement ; Degradation ; Laboratories ; Leakage current ; Mobile handsets ; Stress measurement ; Temperature ; Testing ; Wireless LAN</subject><ispartof>2007 IEEE/MTT-S International Microwave Symposium, 2007, p.639-642</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/4263897$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,27925,54555,54920,54932</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/4263897$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Inoue, Y.</creatorcontrib><creatorcontrib>Masuda, S.</creatorcontrib><creatorcontrib>Kanamura, M.</creatorcontrib><creatorcontrib>Ohki, T.</creatorcontrib><creatorcontrib>Makiyama, K.</creatorcontrib><creatorcontrib>Okamoto, N.</creatorcontrib><creatorcontrib>Imanishi, K.</creatorcontrib><creatorcontrib>Kikkawa, T.</creatorcontrib><creatorcontrib>Hara, N.</creatorcontrib><creatorcontrib>Shigematsu, H.</creatorcontrib><creatorcontrib>Joshin, K.</creatorcontrib><title>Degradation-Mode Analysis for Highly Reliable GaN-HEMT</title><title>2007 IEEE/MTT-S International Microwave Symposium</title><addtitle>MWSYM</addtitle><description>We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degradation. We also discussed the gate leakage current factor, for example, the surface hexagonal pits. Using this eliminating method, we could select the reliable devices with a life of over 1 times 10 6 hours at high-temperature of 200degC.</description><subject>Aluminum gallium nitride</subject><subject>Current measurement</subject><subject>Degradation</subject><subject>Laboratories</subject><subject>Leakage current</subject><subject>Mobile handsets</subject><subject>Stress measurement</subject><subject>Temperature</subject><subject>Testing</subject><subject>Wireless LAN</subject><issn>0149-645X</issn><issn>2576-7216</issn><isbn>1424406870</isbn><isbn>9781424406876</isbn><isbn>1424406889</isbn><isbn>9781424406883</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2007</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNpFjMtKw0AUQMcXGGs_QNzkBybeO687syy1NkKjoBV1VSbOJI7EVpJu8vcKCq7OgQOHsQuEAhHcVfX8-FoVAoAKSc5ZccDOUAmlwFjrDlkmNBlOAs3RfyA4Zhmgctwo_XLKpsPwAQBIRiFRxsx1bHsf_D7ttrzahZjPtr4bhzTkza7Py9S-d2P-ELvk6y7mS3_Hy0W1Pmcnje-GOP3jhD3dLNbzkq_ul7fz2Yq3qPSeG0NQg9O6IWyU_bHgglaNtNo1BgIKg6S9QBdqq4WTWkAEJyF6-UZAcsIuf78pxrj56tOn78eNEkZaR_IbFedHPQ</recordid><startdate>200706</startdate><enddate>200706</enddate><creator>Inoue, Y.</creator><creator>Masuda, S.</creator><creator>Kanamura, M.</creator><creator>Ohki, T.</creator><creator>Makiyama, K.</creator><creator>Okamoto, N.</creator><creator>Imanishi, K.</creator><creator>Kikkawa, T.</creator><creator>Hara, N.</creator><creator>Shigematsu, H.</creator><creator>Joshin, K.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>200706</creationdate><title>Degradation-Mode Analysis for Highly Reliable GaN-HEMT</title><author>Inoue, Y. ; Masuda, S. ; Kanamura, M. ; Ohki, T. ; Makiyama, K. ; Okamoto, N. ; Imanishi, K. ; Kikkawa, T. ; Hara, N. ; Shigematsu, H. ; Joshin, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-g145t-6670b0955f71f48095d9d54f3859f60d126175a219db85293520e0930ea3c7073</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Aluminum gallium nitride</topic><topic>Current measurement</topic><topic>Degradation</topic><topic>Laboratories</topic><topic>Leakage current</topic><topic>Mobile handsets</topic><topic>Stress measurement</topic><topic>Temperature</topic><topic>Testing</topic><topic>Wireless LAN</topic><toplevel>online_resources</toplevel><creatorcontrib>Inoue, Y.</creatorcontrib><creatorcontrib>Masuda, S.</creatorcontrib><creatorcontrib>Kanamura, M.</creatorcontrib><creatorcontrib>Ohki, T.</creatorcontrib><creatorcontrib>Makiyama, K.</creatorcontrib><creatorcontrib>Okamoto, N.</creatorcontrib><creatorcontrib>Imanishi, K.</creatorcontrib><creatorcontrib>Kikkawa, T.</creatorcontrib><creatorcontrib>Hara, N.</creatorcontrib><creatorcontrib>Shigematsu, H.</creatorcontrib><creatorcontrib>Joshin, K.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Inoue, Y.</au><au>Masuda, S.</au><au>Kanamura, M.</au><au>Ohki, T.</au><au>Makiyama, K.</au><au>Okamoto, N.</au><au>Imanishi, K.</au><au>Kikkawa, T.</au><au>Hara, N.</au><au>Shigematsu, H.</au><au>Joshin, K.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Degradation-Mode Analysis for Highly Reliable GaN-HEMT</atitle><btitle>2007 IEEE/MTT-S International Microwave Symposium</btitle><stitle>MWSYM</stitle><date>2007-06</date><risdate>2007</risdate><spage>639</spage><epage>642</epage><pages>639-642</pages><issn>0149-645X</issn><eissn>2576-7216</eissn><isbn>1424406870</isbn><isbn>9781424406876</isbn><eisbn>1424406889</eisbn><eisbn>9781424406883</eisbn><abstract>We analyzed the degradation mode of GaN-HEMTs. We observed the sudden degradation to make serious influence on the reliability. In this paper, we proposed a new approach to eliminate sudden-degradation devices. By measuring the gate leakage current before stress test, we can predict the sudden degradation. We also discussed the gate leakage current factor, for example, the surface hexagonal pits. Using this eliminating method, we could select the reliable devices with a life of over 1 times 10 6 hours at high-temperature of 200degC.</abstract><pub>IEEE</pub><doi>10.1109/MWSYM.2007.379982</doi><tpages>4</tpages></addata></record> |
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ispartof | 2007 IEEE/MTT-S International Microwave Symposium, 2007, p.639-642 |
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subjects | Aluminum gallium nitride Current measurement Degradation Laboratories Leakage current Mobile handsets Stress measurement Temperature Testing Wireless LAN |
title | Degradation-Mode Analysis for Highly Reliable GaN-HEMT |
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