Emissivity independent heating of 3D patterns

It has been shown that for radiative heating systems, 3D patterns have a strong influence on local wafer temperatures during anneal. Since the temperature gradients on the wafer increase with increasing heat up rates and aspect ratios, the importance of these effects is expected to grow when changin...

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Bibliographic Details
Main Authors: Vanormelingen, K., Granneman, E.H.A., Terhorst, H., Rosseel, E., Verheyden, K.
Format: Conference Proceeding
Language:English
Subjects:
Absorption
Annealing
Europe
Heating
Implants
Lamps
Optical films
Optical sensors
Surface topography
Temperature sensors
Online Access:Request full text
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Summary:It has been shown that for radiative heating systems, 3D patterns have a strong influence on local wafer temperatures during anneal. Since the temperature gradients on the wafer increase with increasing heat up rates and aspect ratios, the importance of these effects is expected to grow when changing to future technology nodes. For conductive heating systems the effect of the 3D patterns is negligible.
DOI:10.1109/IWJT.2007.4279969