High Frequency Characterization of Compact N+Poly/Nwell Varactor Using Waffle-Layout

The high frequency characterization of a new waffle layout for N+Poly/Nwell varactor has been studied in STMicroelectronics 65 nm CMOS process. We compare this new waffle layout with model of standard multifingers varactor. In addition to the area saving, the waffle MOS varactor also provides enhanc...

Full description

Saved in:
Bibliographic Details
Main Authors: Morandini, Y., Larchanche, J.-F., Gaquiere, C.
Format: Conference Proceeding
Language:English
Subjects:
CMOS process
CMOS technology
Fingers
Matrix converters
Parasitic capacitance
Plugs
Q factor
Radio frequency
Semiconductor device modeling
Varactors
Online Access:Request full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The high frequency characterization of a new waffle layout for N+Poly/Nwell varactor has been studied in STMicroelectronics 65 nm CMOS process. We compare this new waffle layout with model of standard multifingers varactor. In addition to the area saving, the waffle MOS varactor also provides enhancement to the RF merit figure of varactor through the serial resistance and substrate capacitance improvement.
DOI:10.1109/SMIC.2008.48