Particle removal performance of 20nm rated filters for advanced wet chemical cleaning

The newest 20 nm rated PTFE Alter revealed better performance in both theoretical simulation of particle reduction rate in the bath and actual number of particles on wafers at a fab as compared to the conventional 30 nm ratied filter. As a result, optimally designed 20 nm rated filter is strongly re...

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Bibliographic Details
Main Authors: Nose, M., Tsuzuki, S., Mizuno, T., Numaguchi, T.
Format: Conference Proceeding
Language:English
Subjects:
Bellows
Biomembranes
Chemical technology
Cleaning
Filters
Lithography
Manufacturing processes
Semiconductor device manufacture
Test equipment
Testing
Online Access:Request full text
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Summary:The newest 20 nm rated PTFE Alter revealed better performance in both theoretical simulation of particle reduction rate in the bath and actual number of particles on wafers at a fab as compared to the conventional 30 nm ratied filter. As a result, optimally designed 20 nm rated filter is strongly recommended to use as recirculation filters in wet-benches for advanced semiconductor manufacturing process.
ISSN:1523-553X
DOI:10.1109/ISSM.2007.4446893