Performance enhancement in Asymmetric Gate Dielectric MOSFET

The asymmetric gate dielectric (AGD) MOSFET, where the equivalent dielectric thickness is higher at the source end than at the drain end, is studied with the help of simulations. A study of the properties of this device shows that, compared to the symmetric structure, the channel electric-field is l...

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Bibliographic Details
Main Authors: Havaldar, D.S., Katti, G., Jadeja, B.M., Rao, R., DasGupta, N., DasGupta, A.
Format: Conference Proceeding
Language:English
Subjects:
Acceleration
Charge carriers
Degradation
Dielectric materials
Doping
Drain Induced Barrier Lowering (DIBL)
FETs
Gate Dielectric
Hot carrier effects
MOSFET circuits
MOSFETs
Nonuniform electric fields
Threshold voltage
voltage gain
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Summary:The asymmetric gate dielectric (AGD) MOSFET, where the equivalent dielectric thickness is higher at the source end than at the drain end, is studied with the help of simulations. A study of the properties of this device shows that, compared to the symmetric structure, the channel electric-field is larger at the source end resulting in higher carrier velocity and smaller at the drain end resulting in reduced short channel effects. The AGD devices show lesser drain induced barrier lowering and higher voltage gain compared to conventional devices, which should be useful for both digital and analog applications. The device structure has also been optimized for best performance.
ISSN:2159-1660
DOI:10.1109/ICM.2007.4497742