Voltage Contrast Inspection Methodology for Inline Detection of Missing Spacer and Other Nonvisual Defects

A test structure specifically designed to allow inline detection of missing spacer is introduced. Missing spacer is too small to be physically detected with any current inspection tool and therefore its existence must be flagged using voltage contrast for detection with an e-beam inspection system....

Full description

Saved in:
Bibliographic Details
Published in:IEEE transactions on semiconductor manufacturing 2008-08, Vol.21 (3), p.322-328
Main Authors: Patterson, O.D., Wu, K., Mocuta, D., Nafisi, K.
Format: Article
Language:English
Subjects:
Defect inspection
defect reduction
Defects
e-beam inspection
Electric potential
Electron optics
Geometrical optics
Inspection
inspection scanning electron microscope (SEM)
Learning
Methodology
missing spacer
Monitoring
nonvisual defects
Scanning electron microscopy
Semiconductors
Signal to noise ratio
Silicon on insulator technology
Space technology
Spacers
Testing
Voltage
voltage contrast
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A test structure specifically designed to allow inline detection of missing spacer is introduced. Missing spacer is too small to be physically detected with any current inspection tool and therefore its existence must be flagged using voltage contrast for detection with an e-beam inspection system. The structure and methodology used to address this defect during the ramp of a recent technology is described. Key benefits include a dramatically faster learning cycle and much better signal-to-noise ratio for split experiment evaluation. Missing spacer is one example of a growing class of nonvisual defects which will greatly impact future semiconductor technologies. General principles for designing test structures to detect these defect types are discussed.
ISSN:0894-6507
1558-2345
DOI:10.1109/TSM.2008.2001205