Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etchings method

We have reported periodic pore formation with diameter in 80 nm and aspect ratio above 250 on N + (100) silicon substrate and demonstrated the fabrication of silicon 3-dimensional microstructures by applying double directional etchings method.

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Bibliographic Details
Main Authors: Hippo, D., Kawata, Y., Tsuchiya, Y., Mizuta, H., Oda, S., Urakawa, K., Koshida, N.
Format: Conference Proceeding
Language:English
Subjects:
(220.3740)Lithography
(230.4000) Microstructure fabrication
Etching
Fabrication
Magnetic fields
Microstructure
Photonic crystals
Silicon
Three dimensional displays
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Description
Summary:We have reported periodic pore formation with diameter in 80 nm and aspect ratio above 250 on N + (100) silicon substrate and demonstrated the fabrication of silicon 3-dimensional microstructures by applying double directional etchings method.
ISSN:2160-9004
DOI:10.1109/CLEO.2006.4628638