Test Chip to Evaluate Measurement Methods for Small Capacitances

We designed and fabricated a test chip to evaluate the performance of new approaches to the measurement of small capacitances (femto-Farads to atto-Farads range). The test chip consists of an array of metal-oxide-semiconductor (MOS) capacitors, metal-insulator-metal (MIM) capacitors, and a series of...

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Bibliographic Details
Main Authors: Kopanski, J.J., Afridi, M.Y., Chong Jiang, Richter, C.A.
Format: Conference Proceeding
Language:English
Subjects:
Atomic force microscopy
Atomic measurements
Automatic testing
Capacitance measurement
Metal-insulator structures
MIM capacitors
MOS capacitors
Probes
Semiconductor device measurement
System testing
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Summary:We designed and fabricated a test chip to evaluate the performance of new approaches to the measurement of small capacitances (femto-Farads to atto-Farads range). The test chip consists of an array of metal-oxide-semiconductor (MOS) capacitors, metal-insulator-metal (MIM) capacitors, and a series of systematically varying capacitance structures directly accessible by an atomic force microscope probe. Nominal capacitances of the test devices range from 0.3 fF (10 -15 F) to 1.2 pF (10 -12 F). Measurement of the complete array of capacitances by using an automatic probe station produces a "fingerprint" of capacitance values from which, after correction for pad and other stray capacitances, the relative accuracy and sensitivity of a capacitance measurement instrument can be evaluated..
ISSN:1071-9032
2158-1029
DOI:10.1109/ICMTS.2009.4814606