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Independent Double-Gate Fin SONOS Flash Memory Fabricated With Sidewall Spacer Patterning

Fin silicon-oxide-nitride-oxide-semiconductor (SONOS) flash memories having independent double gates are fabricated and characterized. This device has two sidewall gates sharing one Si fin. To achieve narrow Si fin width over the photolithography limitation, sidewall spacer patterning is adopted. Sp...

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Bibliographic Details
Published in:IEEE transactions on electron devices 2009-08, Vol.56 (8), p.1721-1728
Main Authors: Yun, Jang-Gn, Kim, Yoon, Park, Il Han, Lee, Jung Hoon, Kang, Daewoong, Lee, Myoungrack, Shin, Hyungcheol, Lee, Jong Duk, Park, Byung-Gook
Format: Article
Language:English
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Summary:Fin silicon-oxide-nitride-oxide-semiconductor (SONOS) flash memories having independent double gates are fabricated and characterized. This device has two sidewall gates sharing one Si fin. To achieve narrow Si fin width over the photolithography limitation, sidewall spacer patterning is adopted. Specific fabrication processes for the fin SONOS flash memory having independent double gates are described. Electrical properties related to the opposite gate dependence are characterized. Measurement results of the paired cell interference are delivered.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2009.2024228