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SEGR study on Power MOSFETs: Multiple impacts assumption

The main emphasis of this study is the investigation of the gate degradation or rupture, aiming to determine the nature of the so-called SEGR phenomena. This article presents experimental data showing heavy ions induced gate degradation in power MOSFETs. In the experiments, backside and front-side i...

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Main Authors: Peyre, D., Binois, C., Mangeret, R., Salvaterra, G., Beaumel, M., Pontoni, F., Bouchet, T., Pater, L., Bezerra, F., Ecoffet, R., Lorfevre, E., Sturesson, F., Poivey, C., Berger, G., Foy, J.C., Piquet, B.
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Language:English
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creator Peyre, D.
Binois, C.
Mangeret, R.
Salvaterra, G.
Beaumel, M.
Pontoni, F.
Bouchet, T.
Pater, L.
Bezerra, F.
Ecoffet, R.
Lorfevre, E.
Sturesson, F.
Poivey, C.
Berger, G.
Foy, J.C.
Piquet, B.
description The main emphasis of this study is the investigation of the gate degradation or rupture, aiming to determine the nature of the so-called SEGR phenomena. This article presents experimental data showing heavy ions induced gate degradation in power MOSFETs. In the experiments, backside and front-side irradiations are performed. The heavy ions ranges are tuned in such way to control whether they hit the gate or not, during backside irradiation. Gate-to-source current I gss (phi) is measured versus heavy ions (H.I.) fluence phi. Post-irradiation-gate-stress-test (PGST) allows to measure breakdown voltage V BD (phi) as being decreasing with (H.I.) fluence. Based on these experimental results, an hypothesis of substrate-generated ldquohot carriersrdquo impact overlap may explain gate degradation until SEGR triggering. This last hypothesis is supported by statistical approach model of heavy ions multiple impact.
doi_str_mv 10.1109/RADECS.2007.5205488
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This article presents experimental data showing heavy ions induced gate degradation in power MOSFETs. In the experiments, backside and front-side irradiations are performed. The heavy ions ranges are tuned in such way to control whether they hit the gate or not, during backside irradiation. Gate-to-source current I gss (phi) is measured versus heavy ions (H.I.) fluence phi. Post-irradiation-gate-stress-test (PGST) allows to measure breakdown voltage V BD (phi) as being decreasing with (H.I.) fluence. Based on these experimental results, an hypothesis of substrate-generated ldquohot carriersrdquo impact overlap may explain gate degradation until SEGR triggering. This last hypothesis is supported by statistical approach model of heavy ions multiple impact.</abstract><pub>IEEE</pub><doi>10.1109/RADECS.2007.5205488</doi><tpages>8</tpages></addata></record>
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ispartof 2007 9th European Conference on Radiation and Its Effects on Components and Systems, 2007, p.1-8
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects cumulative phenomenon
Current measurement
Degradation
heavy ions
Hot carriers
Life estimation
MOSFETs
multiple impacts
Particle beams
PGST
Post-irradiation-Gate-Stress-Test
Power MOSFET
SEGR
Structural beams
Synthetic aperture sonar
Testing
Voltage measurement
title SEGR study on Power MOSFETs: Multiple impacts assumption
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