Use of Surface Haze for Evaluation of Photoresist Residue Removal Efficiency

A new method for the fast evaluation of photoresist residue removal efficiency is discussed in this paper. In this method ldquohazerdquo which is the low-frequency component of the background signal of a light scattering instrument is mapped over the entire wafer. Since the background signal is sens...

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Bibliographic Details
Published in:IEEE transactions on semiconductor manufacturing 2009-11, Vol.22 (4), p.587-591
Main Authors: Halder, S., Vos, R., Masayuki, W., Kenis, K., Bearda, T., Radovanovic, S., Dighe, P., Leunissen, L.H.A., Mertens, P.W.
Format: Article
Language:English
Subjects:
Applied sciences
Cleaning
Electronics
Exact sciences and technology
Haze
Instruments
Ion implantation
Light scattering
Metrology
Microelectronic fabrication (materials and surfaces technology)
photoresist residue detection
Photoresists
Residues
Resists
Rough surfaces
Screening
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Semiconductors
Strips
surface haze
Surface roughness
US Department of Transportation
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Summary:A new method for the fast evaluation of photoresist residue removal efficiency is discussed in this paper. In this method ldquohazerdquo which is the low-frequency component of the background signal of a light scattering instrument is mapped over the entire wafer. Since the background signal is sensitive to any kind of surface anomaly, it can be used as a metrology for any kind of surface roughness or residues. The goal of this paper is to devise a fast and cheap screening method for photoresist residue removal efficiency. Using this method we show that cleaning solutions can be easily screened for their residue removal efficiencies based on the haze signal of the light scattering instrument.
ISSN:0894-6507
1558-2345
DOI:10.1109/TSM.2009.2031011