Loading…

45° micro-mirror for out-of-plane coupling of silica-based optical waveguide on si substrate

We describe the fabrication and performance of micro-mirror for silica waveguides on silicon substrate. The micro-mirror consists of four facets, which is produced by wet-etching a pyramid-shaped pit on the backside of the Si-substrate and transferring it to silica waveguide by dry-etching. This mir...

Full description

Saved in:

Bibliographic Details
Main Authors:	Jin-kyoung Oh, Jun-Seok Choi, Dong-Whan Lee, Tae-Won Ha, Hyung-Jong Lee
Format:	Conference Proceeding
Language:	English
Subjects:	Fires Ge-BSG waveguide Glass micro-mirror Mirrors Optical coupling Optical device fabrication Optical surface waves Optical waveguides Planar waveguides Scanning electron microscopy selectivity etch Si mask Silicon compounds
Online Access:	Request full text
Tags:	Add Tag No Tags, Be the first to tag this record!

cited_by
cites
container_end_page	427
container_issue
container_start_page	423
container_title
container_volume
creator	Jin-kyoung Oh Jun-Seok Choi Dong-Whan Lee Tae-Won Ha Hyung-Jong Lee
description	We describe the fabrication and performance of micro-mirror for silica waveguides on silicon substrate. The micro-mirror consists of four facets, which is produced by wet-etching a pyramid-shaped pit on the backside of the Si-substrate and transferring it to silica waveguide by dry-etching. This mirror couples waveguide light normal to waveguide plane. We developed a trench-filled 0.45Delta% Ge-doped borosilicate glass waveguide by flame hydrolysis deposition method to achieve flat surface all over the mirror facet. We observed from scanning electron microscope (SEM) observations that 45deg mirror angle and smooth mirror surface is achieved. The propagation loss of the waveguide including the micro-mirror is measured to be 0.1 dB/cm at 1.55 mum wavelength.
doi_str_mv	10.1109/ISOT.2009.5326153
format	conference_proceeding
fullrecord	<record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_5326153</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>5326153</ieee_id><sourcerecordid>5326153</sourcerecordid><originalsourceid>FETCH-LOGICAL-i90t-dc65dfcdedf1afa6153cc9a56f8822cc348f4bbaf93fd47a04a846f71d735f603</originalsourceid><addsrcrecordid>eNotUFtKw0AUHZGCtnYB4s9sYOo8k8ynFLWFQj_sr5SbeZSRJBNmEsVduQZXZoq9cDmcBxfOReie0RVjVD9u3_aHFadUr5TgBVPiCs2Z5FJKPtnXaKnL6sKpLmZofs5qyibxBi1z_qDTSMVFRW_Ru1S_P7gNJkXShpRiwn7aOA4ketI30Dls4tg3oTvh6HEOTTBAasjO4tgPE2nwF3y60xisw7GbEjiPdR4SDO4OzTw02S0vuECHl-fDekN2-9ft-mlHgqYDsaZQ1hvrrGfg4VzJGA2q8FXFuTFCVl7WNXgtvJUlUAmVLHzJbCmUL6hYoIf_s8E5d-xTaCF9Hy_fEX8_VFh-</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>45° micro-mirror for out-of-plane coupling of silica-based optical waveguide on si substrate</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Jin-kyoung Oh ; Jun-Seok Choi ; Dong-Whan Lee ; Tae-Won Ha ; Hyung-Jong Lee</creator><creatorcontrib>Jin-kyoung Oh ; Jun-Seok Choi ; Dong-Whan Lee ; Tae-Won Ha ; Hyung-Jong Lee</creatorcontrib><description>We describe the fabrication and performance of micro-mirror for silica waveguides on silicon substrate. The micro-mirror consists of four facets, which is produced by wet-etching a pyramid-shaped pit on the backside of the Si-substrate and transferring it to silica waveguide by dry-etching. This mirror couples waveguide light normal to waveguide plane. We developed a trench-filled 0.45Delta% Ge-doped borosilicate glass waveguide by flame hydrolysis deposition method to achieve flat surface all over the mirror facet. We observed from scanning electron microscope (SEM) observations that 45deg mirror angle and smooth mirror surface is achieved. The propagation loss of the waveguide including the micro-mirror is measured to be 0.1 dB/cm at 1.55 mum wavelength.</description><identifier>ISBN: 9781424442096</identifier><identifier>ISBN: 1424442095</identifier><identifier>EISBN: 1424442109</identifier><identifier>EISBN: 9781424442102</identifier><identifier>DOI: 10.1109/ISOT.2009.5326153</identifier><identifier>LCCN: 2009901814</identifier><language>eng</language><publisher>IEEE</publisher><subject>Fires ; Ge-BSG waveguide ; Glass ; micro-mirror ; Mirrors ; Optical coupling ; Optical device fabrication ; Optical surface waves ; Optical waveguides ; Planar waveguides ; Scanning electron microscopy ; selectivity etch ; Si mask ; Silicon compounds</subject><ispartof>2009 International Symposium on Optomechatronic Technologies, 2009, p.423-427</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/5326153$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,27925,54920</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/5326153$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Jin-kyoung Oh</creatorcontrib><creatorcontrib>Jun-Seok Choi</creatorcontrib><creatorcontrib>Dong-Whan Lee</creatorcontrib><creatorcontrib>Tae-Won Ha</creatorcontrib><creatorcontrib>Hyung-Jong Lee</creatorcontrib><title>45° micro-mirror for out-of-plane coupling of silica-based optical waveguide on si substrate</title><title>2009 International Symposium on Optomechatronic Technologies</title><addtitle>ISOT</addtitle><description>We describe the fabrication and performance of micro-mirror for silica waveguides on silicon substrate. The micro-mirror consists of four facets, which is produced by wet-etching a pyramid-shaped pit on the backside of the Si-substrate and transferring it to silica waveguide by dry-etching. This mirror couples waveguide light normal to waveguide plane. We developed a trench-filled 0.45Delta% Ge-doped borosilicate glass waveguide by flame hydrolysis deposition method to achieve flat surface all over the mirror facet. We observed from scanning electron microscope (SEM) observations that 45deg mirror angle and smooth mirror surface is achieved. The propagation loss of the waveguide including the micro-mirror is measured to be 0.1 dB/cm at 1.55 mum wavelength.</description><subject>Fires</subject><subject>Ge-BSG waveguide</subject><subject>Glass</subject><subject>micro-mirror</subject><subject>Mirrors</subject><subject>Optical coupling</subject><subject>Optical device fabrication</subject><subject>Optical surface waves</subject><subject>Optical waveguides</subject><subject>Planar waveguides</subject><subject>Scanning electron microscopy</subject><subject>selectivity etch</subject><subject>Si mask</subject><subject>Silicon compounds</subject><isbn>9781424442096</isbn><isbn>1424442095</isbn><isbn>1424442109</isbn><isbn>9781424442102</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2009</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNotUFtKw0AUHZGCtnYB4s9sYOo8k8ynFLWFQj_sr5SbeZSRJBNmEsVduQZXZoq9cDmcBxfOReie0RVjVD9u3_aHFadUr5TgBVPiCs2Z5FJKPtnXaKnL6sKpLmZofs5qyibxBi1z_qDTSMVFRW_Ru1S_P7gNJkXShpRiwn7aOA4ketI30Dls4tg3oTvh6HEOTTBAasjO4tgPE2nwF3y60xisw7GbEjiPdR4SDO4OzTw02S0vuECHl-fDekN2-9ft-mlHgqYDsaZQ1hvrrGfg4VzJGA2q8FXFuTFCVl7WNXgtvJUlUAmVLHzJbCmUL6hYoIf_s8E5d-xTaCF9Hy_fEX8_VFh-</recordid><startdate>200909</startdate><enddate>200909</enddate><creator>Jin-kyoung Oh</creator><creator>Jun-Seok Choi</creator><creator>Dong-Whan Lee</creator><creator>Tae-Won Ha</creator><creator>Hyung-Jong Lee</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>200909</creationdate><title>45° micro-mirror for out-of-plane coupling of silica-based optical waveguide on si substrate</title><author>Jin-kyoung Oh ; Jun-Seok Choi ; Dong-Whan Lee ; Tae-Won Ha ; Hyung-Jong Lee</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i90t-dc65dfcdedf1afa6153cc9a56f8822cc348f4bbaf93fd47a04a846f71d735f603</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Fires</topic><topic>Ge-BSG waveguide</topic><topic>Glass</topic><topic>micro-mirror</topic><topic>Mirrors</topic><topic>Optical coupling</topic><topic>Optical device fabrication</topic><topic>Optical surface waves</topic><topic>Optical waveguides</topic><topic>Planar waveguides</topic><topic>Scanning electron microscopy</topic><topic>selectivity etch</topic><topic>Si mask</topic><topic>Silicon compounds</topic><toplevel>online_resources</toplevel><creatorcontrib>Jin-kyoung Oh</creatorcontrib><creatorcontrib>Jun-Seok Choi</creatorcontrib><creatorcontrib>Dong-Whan Lee</creatorcontrib><creatorcontrib>Tae-Won Ha</creatorcontrib><creatorcontrib>Hyung-Jong Lee</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Jin-kyoung Oh</au><au>Jun-Seok Choi</au><au>Dong-Whan Lee</au><au>Tae-Won Ha</au><au>Hyung-Jong Lee</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>45° micro-mirror for out-of-plane coupling of silica-based optical waveguide on si substrate</atitle><btitle>2009 International Symposium on Optomechatronic Technologies</btitle><stitle>ISOT</stitle><date>2009-09</date><risdate>2009</risdate><spage>423</spage><epage>427</epage><pages>423-427</pages><isbn>9781424442096</isbn><isbn>1424442095</isbn><eisbn>1424442109</eisbn><eisbn>9781424442102</eisbn><abstract>We describe the fabrication and performance of micro-mirror for silica waveguides on silicon substrate. The micro-mirror consists of four facets, which is produced by wet-etching a pyramid-shaped pit on the backside of the Si-substrate and transferring it to silica waveguide by dry-etching. This mirror couples waveguide light normal to waveguide plane. We developed a trench-filled 0.45Delta% Ge-doped borosilicate glass waveguide by flame hydrolysis deposition method to achieve flat surface all over the mirror facet. We observed from scanning electron microscope (SEM) observations that 45deg mirror angle and smooth mirror surface is achieved. The propagation loss of the waveguide including the micro-mirror is measured to be 0.1 dB/cm at 1.55 mum wavelength.</abstract><pub>IEEE</pub><doi>10.1109/ISOT.2009.5326153</doi><tpages>5</tpages></addata></record>
fulltext	fulltext_linktorsrc
identifier	ISBN: 9781424442096
ispartof	2009 International Symposium on Optomechatronic Technologies, 2009, p.423-427
issn
language	eng
recordid	cdi_ieee_primary_5326153
source	IEEE Electronic Library (IEL) Conference Proceedings
subjects	Fires Ge-BSG waveguide Glass micro-mirror Mirrors Optical coupling Optical device fabrication Optical surface waves Optical waveguides Planar waveguides Scanning electron microscopy selectivity etch Si mask Silicon compounds
title	45° micro-mirror for out-of-plane coupling of silica-based optical waveguide on si substrate
url	http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T04%3A20%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=45%C2%B0%20micro-mirror%20for%20out-of-plane%20coupling%20of%20silica-based%20optical%20waveguide%20on%20si%20substrate&rft.btitle=2009%20International%20Symposium%20on%20Optomechatronic%20Technologies&rft.au=Jin-kyoung%20Oh&rft.date=2009-09&rft.spage=423&rft.epage=427&rft.pages=423-427&rft.isbn=9781424442096&rft.isbn_list=1424442095&rft_id=info:doi/10.1109/ISOT.2009.5326153&rft.eisbn=1424442109&rft.eisbn_list=9781424442102&rft_dat=%3Cieee_6IE%3E5326153%3C/ieee_6IE%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i90t-dc65dfcdedf1afa6153cc9a56f8822cc348f4bbaf93fd47a04a846f71d735f603%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=5326153&rfr_iscdi=true