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Track profile study of ABS-patterned narrow track thin film inductive heads
ABS-patterning is a known method for achieving the ever-increasing track density requirements of today's disk drives. This patterning leaves a shoulder on either side of the head which can affect the track profile of the head. Therefore, the height and width of this shoulder are important param...
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Published in: | IEEE transactions on magnetics 1996-09, Vol.32 (5), p.3539-3541 |
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container_end_page | 3541 |
container_issue | 5 |
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container_title | IEEE transactions on magnetics |
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creator | Partee, C. Torabi, A.F. |
description | ABS-patterning is a known method for achieving the ever-increasing track density requirements of today's disk drives. This patterning leaves a shoulder on either side of the head which can affect the track profile of the head. Therefore, the height and width of this shoulder are important parameters to control when fabricating heads in this fashion. In this study, we examine the effect of the shoulder width and the shoulder height on the cross-track performance. We conclude that a shoulder height of 0.75 /spl mu/m is sufficient to minimize the effect of a shoulder width of up to 1 /spl mu/m. A 3D model was constructed and shows good agreement with the data. The model was used to predict throat-height tolerance and to model wider shoulder widths. |
doi_str_mv | 10.1109/20.538683 |
format | article |
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This patterning leaves a shoulder on either side of the head which can affect the track profile of the head. Therefore, the height and width of this shoulder are important parameters to control when fabricating heads in this fashion. In this study, we examine the effect of the shoulder width and the shoulder height on the cross-track performance. We conclude that a shoulder height of 0.75 /spl mu/m is sufficient to minimize the effect of a shoulder width of up to 1 /spl mu/m. A 3D model was constructed and shows good agreement with the data. The model was used to predict throat-height tolerance and to model wider shoulder widths.</description><identifier>ISSN: 0018-9464</identifier><identifier>EISSN: 1941-0069</identifier><identifier>DOI: 10.1109/20.538683</identifier><identifier>CODEN: IEMGAQ</identifier><language>eng</language><publisher>IEEE</publisher><subject>Disk drives ; Etching ; Fabrication ; Finite element methods ; Lithography ; Predictive models ; Resists ; Surfaces ; Transistors ; Writing</subject><ispartof>IEEE transactions on magnetics, 1996-09, Vol.32 (5), p.3539-3541</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c277t-dc295475b090481cae8884d4250903fdc28085d622e6b1b92457dce1f23ef6923</citedby><cites>FETCH-LOGICAL-c277t-dc295475b090481cae8884d4250903fdc28085d622e6b1b92457dce1f23ef6923</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/538683$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,54796</link.rule.ids></links><search><creatorcontrib>Partee, C.</creatorcontrib><creatorcontrib>Torabi, A.F.</creatorcontrib><title>Track profile study of ABS-patterned narrow track thin film inductive heads</title><title>IEEE transactions on magnetics</title><addtitle>TMAG</addtitle><description>ABS-patterning is a known method for achieving the ever-increasing track density requirements of today's disk drives. This patterning leaves a shoulder on either side of the head which can affect the track profile of the head. Therefore, the height and width of this shoulder are important parameters to control when fabricating heads in this fashion. In this study, we examine the effect of the shoulder width and the shoulder height on the cross-track performance. We conclude that a shoulder height of 0.75 /spl mu/m is sufficient to minimize the effect of a shoulder width of up to 1 /spl mu/m. A 3D model was constructed and shows good agreement with the data. The model was used to predict throat-height tolerance and to model wider shoulder widths.</description><subject>Disk drives</subject><subject>Etching</subject><subject>Fabrication</subject><subject>Finite element methods</subject><subject>Lithography</subject><subject>Predictive models</subject><subject>Resists</subject><subject>Surfaces</subject><subject>Transistors</subject><subject>Writing</subject><issn>0018-9464</issn><issn>1941-0069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1996</creationdate><recordtype>article</recordtype><recordid>eNo90DtPwzAQAGALgUQpDKxMnpAYUmzHTuyxIF6iEgNltlz7ohrSpNgOqP8eQyqm0919Ot0dQueUzCgl6pqRmShlJcsDNKGK04KQSh2iCSFUFopX_BidxPieUy4omaDnZTD2A29D3_gWcEyD2-G-wfOb12JrUoLQgcOdCaH_xunPprXvcNYb7Ds32OS_AK_BuHiKjhrTRjjbxyl6u79b3j4Wi5eHp9v5orCsrlPhLFOC12JFFOGSWgNSSu44E7lQNrktiRSuYgyqFV0pxkXtLNCGldBUipVTdDnOzVt_DhCT3vhooW1NB_0QNcv300qJDK9GaEMfY4BGb4PfmLDTlOjfd2lG9PiubC9G6wHg3-2bPyJeY_0</recordid><startdate>19960901</startdate><enddate>19960901</enddate><creator>Partee, C.</creator><creator>Torabi, A.F.</creator><general>IEEE</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>19960901</creationdate><title>Track profile study of ABS-patterned narrow track thin film inductive heads</title><author>Partee, C. ; Torabi, A.F.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c277t-dc295475b090481cae8884d4250903fdc28085d622e6b1b92457dce1f23ef6923</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1996</creationdate><topic>Disk drives</topic><topic>Etching</topic><topic>Fabrication</topic><topic>Finite element methods</topic><topic>Lithography</topic><topic>Predictive models</topic><topic>Resists</topic><topic>Surfaces</topic><topic>Transistors</topic><topic>Writing</topic><toplevel>online_resources</toplevel><creatorcontrib>Partee, C.</creatorcontrib><creatorcontrib>Torabi, A.F.</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on magnetics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Partee, C.</au><au>Torabi, A.F.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Track profile study of ABS-patterned narrow track thin film inductive heads</atitle><jtitle>IEEE transactions on magnetics</jtitle><stitle>TMAG</stitle><date>1996-09-01</date><risdate>1996</risdate><volume>32</volume><issue>5</issue><spage>3539</spage><epage>3541</epage><pages>3539-3541</pages><issn>0018-9464</issn><eissn>1941-0069</eissn><coden>IEMGAQ</coden><abstract>ABS-patterning is a known method for achieving the ever-increasing track density requirements of today's disk drives. This patterning leaves a shoulder on either side of the head which can affect the track profile of the head. Therefore, the height and width of this shoulder are important parameters to control when fabricating heads in this fashion. In this study, we examine the effect of the shoulder width and the shoulder height on the cross-track performance. We conclude that a shoulder height of 0.75 /spl mu/m is sufficient to minimize the effect of a shoulder width of up to 1 /spl mu/m. A 3D model was constructed and shows good agreement with the data. The model was used to predict throat-height tolerance and to model wider shoulder widths.</abstract><pub>IEEE</pub><doi>10.1109/20.538683</doi><tpages>3</tpages></addata></record> |
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issn | 0018-9464 1941-0069 |
language | eng |
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source | IEEE Xplore (Online service) |
subjects | Disk drives Etching Fabrication Finite element methods Lithography Predictive models Resists Surfaces Transistors Writing |
title | Track profile study of ABS-patterned narrow track thin film inductive heads |
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