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Direct growth of Bismuth Telluride nanowires by On-Film Formation of Nanowires for high-efficiency thermoelectric devices
We report a novel stress-induced method to grow single crystalline Bi 2 Te 3 nanowires, On Film Formation of Nanowires (OFF-ON), their growth mechanism and transport properties. Single crystalline Bi 2 Te 3 nanowires were found to grow on as-sputter ed BiTe films after thermal annealing at 350°C. Th...
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creator | Jinhee Ham Wooyoung Shim Do Hyun Kim Seunghyun Lee Jongwook Roh Sung Woo Sohn Kyu Hwan Oh Voorhees, P.W. Wooyoung Lee |
description | We report a novel stress-induced method to grow single crystalline Bi 2 Te 3 nanowires, On Film Formation of Nanowires (OFF-ON), their growth mechanism and transport properties. Single crystalline Bi 2 Te 3 nanowires were found to grow on as-sputter ed BiTe films after thermal annealing at 350°C. This growth was facilitated by stress relaxation between the film and the thermally oxidized Si substrate originating from a mismatch of the thermal expansion. The mechanism for wire growth is stress-induced mass flow along grain boundaries in the polycrystalline film. |
doi_str_mv | 10.1109/INEC.2010.5424556 |
format | conference_proceeding |
fullrecord | <record><control><sourceid>ieee_CHZPO</sourceid><recordid>TN_cdi_ieee_primary_5424556</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>5424556</ieee_id><sourcerecordid>5424556</sourcerecordid><originalsourceid>FETCH-LOGICAL-i175t-989ce95268507c0f67dc3830e0ff2f572d9f3e8f14f55d12265309f8f4ad3fe03</originalsourceid><addsrcrecordid>eNo9kM1OwzAQhI2gEm3pAyAufoGU9V9iH6G0UKlqL-VcBWfdGCUxclKqvD1B_OxlZqRvd6Uh5JbBnDEw9-vtcjHnMEQluVQqvSATNjgplJTZJZmZTP9lwa_ImDNlEqG4GJEJB9CGDQPXZNa27wAgmNZGyzHpn3xE29FjDOeupMHRR9_Wp8HusapO0RdIm7wJ5wFr6VtPd02y8lVNVyHWeedD872z_SdciLT0xzJB57z12NiediXGOmA1_Ine0gI_vcX2hoxcXrU4-9UpeV0t94uXZLN7Xi8eNolnmeoSo41Fo3iqFWQWXJoVVmgBCM5xpzJeGCdQOyadUgXjPFUCjNNO5oVwCGJK7n7uekQ8fERf57E__NYovgD5YWNt</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Direct growth of Bismuth Telluride nanowires by On-Film Formation of Nanowires for high-efficiency thermoelectric devices</title><source>IEEE Xplore All Conference Series</source><creator>Jinhee Ham ; Wooyoung Shim ; Do Hyun Kim ; Seunghyun Lee ; Jongwook Roh ; Sung Woo Sohn ; Kyu Hwan Oh ; Voorhees, P.W. ; Wooyoung Lee</creator><creatorcontrib>Jinhee Ham ; Wooyoung Shim ; Do Hyun Kim ; Seunghyun Lee ; Jongwook Roh ; Sung Woo Sohn ; Kyu Hwan Oh ; Voorhees, P.W. ; Wooyoung Lee</creatorcontrib><description>We report a novel stress-induced method to grow single crystalline Bi 2 Te 3 nanowires, On Film Formation of Nanowires (OFF-ON), their growth mechanism and transport properties. Single crystalline Bi 2 Te 3 nanowires were found to grow on as-sputter ed BiTe films after thermal annealing at 350°C. This growth was facilitated by stress relaxation between the film and the thermally oxidized Si substrate originating from a mismatch of the thermal expansion. The mechanism for wire growth is stress-induced mass flow along grain boundaries in the polycrystalline film.</description><identifier>ISSN: 2159-3523</identifier><identifier>ISBN: 9781424435432</identifier><identifier>ISBN: 1424435439</identifier><identifier>EISBN: 1424435447</identifier><identifier>EISBN: 9781424435449</identifier><identifier>DOI: 10.1109/INEC.2010.5424556</identifier><identifier>LCCN: 2008911110</identifier><language>eng</language><publisher>IEEE</publisher><subject>Annealing ; Bismuth ; Crystallization ; Mechanical factors ; Nanowires ; Semiconductor films ; Tellurium ; Thermal expansion ; Thermal stresses ; Thermoelectric devices</subject><ispartof>2010 3rd International Nanoelectronics Conference (INEC), 2010, p.105-106</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/5424556$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2057,27924,54554,54919,54931</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/5424556$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Jinhee Ham</creatorcontrib><creatorcontrib>Wooyoung Shim</creatorcontrib><creatorcontrib>Do Hyun Kim</creatorcontrib><creatorcontrib>Seunghyun Lee</creatorcontrib><creatorcontrib>Jongwook Roh</creatorcontrib><creatorcontrib>Sung Woo Sohn</creatorcontrib><creatorcontrib>Kyu Hwan Oh</creatorcontrib><creatorcontrib>Voorhees, P.W.</creatorcontrib><creatorcontrib>Wooyoung Lee</creatorcontrib><title>Direct growth of Bismuth Telluride nanowires by On-Film Formation of Nanowires for high-efficiency thermoelectric devices</title><title>2010 3rd International Nanoelectronics Conference (INEC)</title><addtitle>INEC</addtitle><description>We report a novel stress-induced method to grow single crystalline Bi 2 Te 3 nanowires, On Film Formation of Nanowires (OFF-ON), their growth mechanism and transport properties. Single crystalline Bi 2 Te 3 nanowires were found to grow on as-sputter ed BiTe films after thermal annealing at 350°C. This growth was facilitated by stress relaxation between the film and the thermally oxidized Si substrate originating from a mismatch of the thermal expansion. The mechanism for wire growth is stress-induced mass flow along grain boundaries in the polycrystalline film.</description><subject>Annealing</subject><subject>Bismuth</subject><subject>Crystallization</subject><subject>Mechanical factors</subject><subject>Nanowires</subject><subject>Semiconductor films</subject><subject>Tellurium</subject><subject>Thermal expansion</subject><subject>Thermal stresses</subject><subject>Thermoelectric devices</subject><issn>2159-3523</issn><isbn>9781424435432</isbn><isbn>1424435439</isbn><isbn>1424435447</isbn><isbn>9781424435449</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2010</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNo9kM1OwzAQhI2gEm3pAyAufoGU9V9iH6G0UKlqL-VcBWfdGCUxclKqvD1B_OxlZqRvd6Uh5JbBnDEw9-vtcjHnMEQluVQqvSATNjgplJTZJZmZTP9lwa_ImDNlEqG4GJEJB9CGDQPXZNa27wAgmNZGyzHpn3xE29FjDOeupMHRR9_Wp8HusapO0RdIm7wJ5wFr6VtPd02y8lVNVyHWeedD872z_SdciLT0xzJB57z12NiediXGOmA1_Ine0gI_vcX2hoxcXrU4-9UpeV0t94uXZLN7Xi8eNolnmeoSo41Fo3iqFWQWXJoVVmgBCM5xpzJeGCdQOyadUgXjPFUCjNNO5oVwCGJK7n7uekQ8fERf57E__NYovgD5YWNt</recordid><startdate>201001</startdate><enddate>201001</enddate><creator>Jinhee Ham</creator><creator>Wooyoung Shim</creator><creator>Do Hyun Kim</creator><creator>Seunghyun Lee</creator><creator>Jongwook Roh</creator><creator>Sung Woo Sohn</creator><creator>Kyu Hwan Oh</creator><creator>Voorhees, P.W.</creator><creator>Wooyoung Lee</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>201001</creationdate><title>Direct growth of Bismuth Telluride nanowires by On-Film Formation of Nanowires for high-efficiency thermoelectric devices</title><author>Jinhee Ham ; Wooyoung Shim ; Do Hyun Kim ; Seunghyun Lee ; Jongwook Roh ; Sung Woo Sohn ; Kyu Hwan Oh ; Voorhees, P.W. ; Wooyoung Lee</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i175t-989ce95268507c0f67dc3830e0ff2f572d9f3e8f14f55d12265309f8f4ad3fe03</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Annealing</topic><topic>Bismuth</topic><topic>Crystallization</topic><topic>Mechanical factors</topic><topic>Nanowires</topic><topic>Semiconductor films</topic><topic>Tellurium</topic><topic>Thermal expansion</topic><topic>Thermal stresses</topic><topic>Thermoelectric devices</topic><toplevel>online_resources</toplevel><creatorcontrib>Jinhee Ham</creatorcontrib><creatorcontrib>Wooyoung Shim</creatorcontrib><creatorcontrib>Do Hyun Kim</creatorcontrib><creatorcontrib>Seunghyun Lee</creatorcontrib><creatorcontrib>Jongwook Roh</creatorcontrib><creatorcontrib>Sung Woo Sohn</creatorcontrib><creatorcontrib>Kyu Hwan Oh</creatorcontrib><creatorcontrib>Voorhees, P.W.</creatorcontrib><creatorcontrib>Wooyoung Lee</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Jinhee Ham</au><au>Wooyoung Shim</au><au>Do Hyun Kim</au><au>Seunghyun Lee</au><au>Jongwook Roh</au><au>Sung Woo Sohn</au><au>Kyu Hwan Oh</au><au>Voorhees, P.W.</au><au>Wooyoung Lee</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Direct growth of Bismuth Telluride nanowires by On-Film Formation of Nanowires for high-efficiency thermoelectric devices</atitle><btitle>2010 3rd International Nanoelectronics Conference (INEC)</btitle><stitle>INEC</stitle><date>2010-01</date><risdate>2010</risdate><spage>105</spage><epage>106</epage><pages>105-106</pages><issn>2159-3523</issn><isbn>9781424435432</isbn><isbn>1424435439</isbn><eisbn>1424435447</eisbn><eisbn>9781424435449</eisbn><abstract>We report a novel stress-induced method to grow single crystalline Bi 2 Te 3 nanowires, On Film Formation of Nanowires (OFF-ON), their growth mechanism and transport properties. Single crystalline Bi 2 Te 3 nanowires were found to grow on as-sputter ed BiTe films after thermal annealing at 350°C. This growth was facilitated by stress relaxation between the film and the thermally oxidized Si substrate originating from a mismatch of the thermal expansion. The mechanism for wire growth is stress-induced mass flow along grain boundaries in the polycrystalline film.</abstract><pub>IEEE</pub><doi>10.1109/INEC.2010.5424556</doi><tpages>2</tpages></addata></record> |
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ispartof | 2010 3rd International Nanoelectronics Conference (INEC), 2010, p.105-106 |
issn | 2159-3523 |
language | eng |
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source | IEEE Xplore All Conference Series |
subjects | Annealing Bismuth Crystallization Mechanical factors Nanowires Semiconductor films Tellurium Thermal expansion Thermal stresses Thermoelectric devices |
title | Direct growth of Bismuth Telluride nanowires by On-Film Formation of Nanowires for high-efficiency thermoelectric devices |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T08%3A10%3A59IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_CHZPO&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Direct%20growth%20of%20Bismuth%20Telluride%20nanowires%20by%20On-Film%20Formation%20of%20Nanowires%20for%20high-efficiency%20thermoelectric%20devices&rft.btitle=2010%203rd%20International%20Nanoelectronics%20Conference%20(INEC)&rft.au=Jinhee%20Ham&rft.date=2010-01&rft.spage=105&rft.epage=106&rft.pages=105-106&rft.issn=2159-3523&rft.isbn=9781424435432&rft.isbn_list=1424435439&rft_id=info:doi/10.1109/INEC.2010.5424556&rft.eisbn=1424435447&rft.eisbn_list=9781424435449&rft_dat=%3Cieee_CHZPO%3E5424556%3C/ieee_CHZPO%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i175t-989ce95268507c0f67dc3830e0ff2f572d9f3e8f14f55d12265309f8f4ad3fe03%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=5424556&rfr_iscdi=true |