TITAN-RTA: a 2D integrated equipment and process model for simulation of rapid thermal processing

An integrated model for the simulation of the exact thermal behaviour of a silicon wafer during optical rapid thermal processing coupled to the microscopic thermal processing effects of dopant diffusion and oxidation is presented.

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Bibliographic Details
Main Authors: Jones, S K, Gerodolle, A
Format: Conference Proceeding
Language:English
Subjects:
Error correction
Implants
Lamps
Optical microscopy
Oxidation
Predictive models
Rapid thermal processing
Semiconductor device modeling
Semiconductor process modeling
Temperature control
Online Access:Request full text
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Description
Summary:An integrated model for the simulation of the exact thermal behaviour of a silicon wafer during optical rapid thermal processing coupled to the microscopic thermal processing effects of dopant diffusion and oxidation is presented.