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Non-destructive current-ramp dielectric breakdown (IRDB) for fast BEOL reliability monitoring
A fast current-ramp dielectric breakdown (IRDB) method is developed for critical dielectric reliability assessment. Unlike the conventional voltage-ramp method, the nondestructive nature of IRDB still allows wafers to be shipped for revenue after reliability monitoring. This is an important criterio...
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creator | Kok-Yong Yiang Francis, Rick Marathe, Amit Aubel, Oliver |
description | A fast current-ramp dielectric breakdown (IRDB) method is developed for critical dielectric reliability assessment. Unlike the conventional voltage-ramp method, the nondestructive nature of IRDB still allows wafers to be shipped for revenue after reliability monitoring. This is an important criterion for reduced-cost, high-volume manufacturing. |
doi_str_mv | 10.1109/IRPS.2010.5488842 |
format | conference_proceeding |
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This is an important criterion for reduced-cost, high-volume manufacturing.</description><subject>Breakdown voltage</subject><subject>Current measurement</subject><subject>Dielectric breakdown</subject><subject>Dielectric measurements</subject><subject>Electric breakdown</subject><subject>IRDB</subject><subject>Leakage current</subject><subject>Manufacturing</subject><subject>Monitoring</subject><subject>Power dissipation</subject><subject>Voltage measurement</subject><subject>VRDB</subject><issn>1541-7026</issn><issn>1938-1891</issn><isbn>1424454301</isbn><isbn>9781424454303</isbn><isbn>1424454298</isbn><isbn>9781424454297</isbn><isbn>9781424454310</isbn><isbn>142445431X</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2010</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNo9kEtLAzEYReOjYK39AeImS11E855kaWvVQrFSdSklk3wj0elMyaRK_70Fi3dzuBy4i4vQOaPXjFF7M108v1xzuqtKGmMkP0CnTHIpleTWHKI-s8IQZiw7-heCsuOdUJKRgnLdQ33DiZZUMHGChl33SXeRimsp--j9qW1IgC6njc_xG7DfpARNJsmt1jhEqMHnFD0uE7iv0P40-HK6uBtd4apNuHJdxqPJfIYT1NGVsY55i1dtE3ObYvNxhnqVqzsY7jlAb_eT1_Ejmc0fpuPbGYmsUJl4VQpdUatoFUThvbDclk4UilvLTSE8dyFURQneggYoGTBTUM20ZaoK2ooBuvjbjQCwXKe4cmm73F8mfgFzv1nB</recordid><startdate>201005</startdate><enddate>201005</enddate><creator>Kok-Yong Yiang</creator><creator>Francis, Rick</creator><creator>Marathe, Amit</creator><creator>Aubel, Oliver</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>201005</creationdate><title>Non-destructive current-ramp dielectric breakdown (IRDB) for fast BEOL reliability monitoring</title><author>Kok-Yong Yiang ; Francis, Rick ; Marathe, Amit ; Aubel, Oliver</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i175t-c5b36f0950fd37cc3929ba3752992873c2addf7bec9e6eeb1e1870616915fd693</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2010</creationdate><topic>Breakdown voltage</topic><topic>Current measurement</topic><topic>Dielectric breakdown</topic><topic>Dielectric measurements</topic><topic>Electric breakdown</topic><topic>IRDB</topic><topic>Leakage current</topic><topic>Manufacturing</topic><topic>Monitoring</topic><topic>Power dissipation</topic><topic>Voltage measurement</topic><topic>VRDB</topic><toplevel>online_resources</toplevel><creatorcontrib>Kok-Yong Yiang</creatorcontrib><creatorcontrib>Francis, Rick</creatorcontrib><creatorcontrib>Marathe, Amit</creatorcontrib><creatorcontrib>Aubel, Oliver</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEL</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Kok-Yong Yiang</au><au>Francis, Rick</au><au>Marathe, Amit</au><au>Aubel, Oliver</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Non-destructive current-ramp dielectric breakdown (IRDB) for fast BEOL reliability monitoring</atitle><btitle>2010 IEEE International Reliability Physics Symposium</btitle><stitle>IRPS</stitle><date>2010-05</date><risdate>2010</risdate><spage>117</spage><epage>119</epage><pages>117-119</pages><issn>1541-7026</issn><eissn>1938-1891</eissn><isbn>1424454301</isbn><isbn>9781424454303</isbn><eisbn>1424454298</eisbn><eisbn>9781424454297</eisbn><eisbn>9781424454310</eisbn><eisbn>142445431X</eisbn><abstract>A fast current-ramp dielectric breakdown (IRDB) method is developed for critical dielectric reliability assessment. Unlike the conventional voltage-ramp method, the nondestructive nature of IRDB still allows wafers to be shipped for revenue after reliability monitoring. This is an important criterion for reduced-cost, high-volume manufacturing.</abstract><pub>IEEE</pub><doi>10.1109/IRPS.2010.5488842</doi><tpages>3</tpages></addata></record> |
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identifier | ISSN: 1541-7026 |
ispartof | 2010 IEEE International Reliability Physics Symposium, 2010, p.117-119 |
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language | eng |
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source | IEEE Xplore All Conference Series |
subjects | Breakdown voltage Current measurement Dielectric breakdown Dielectric measurements Electric breakdown IRDB Leakage current Manufacturing Monitoring Power dissipation Voltage measurement VRDB |
title | Non-destructive current-ramp dielectric breakdown (IRDB) for fast BEOL reliability monitoring |
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