Laser produced plasma light sources for EUV lithography

We present the latest results on high-power extreme-ultraviolet (EUV) light sources for lithography. This includes operation of high-power pulsed CO 2 lasers, high repetition-rate Sn droplet targets, and collection of EUV light using multilayer-coated optics.

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Bibliographic Details
Main Author: La Fontaine, Bruno
Format: Conference Proceeding
Language:English
Subjects:
(140.0140) Lasers and laser optics
(140.4130) Molecular gas lasers
(340.7480) X-rays
extreme ultraviolet (EUV)
Gas lasers
Light sources
Lithography
Optical pulse generation
Optical pulses
Plasma sources
Semiconductor device manufacture
Semiconductor lasers
soft x-rays
Tin
Ultraviolet sources
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Description
Summary:We present the latest results on high-power extreme-ultraviolet (EUV) light sources for lithography. This includes operation of high-power pulsed CO 2 lasers, high repetition-rate Sn droplet targets, and collection of EUV light using multilayer-coated optics.
DOI:10.1364/CLEO_APPS.2010.AFA4