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The "micromorph" solar cell: extending a-Si:H technology towards thin film crystalline silicon

Progress of solar cells based on plasma deposited hydrogenated microcrystalline silicon (/spl mu/c-Si:H), as well as on combined a-Si:H//spl mu/c-Si:H stacked "micromorph" solar cells is reported. /spl mu/c-Si:H p-i-n cells with a thickness of 3.6 /spl mu/m, deposited with the use of a gas...

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Main Authors: Fischer, D., Dubail, S., Selvan, J.A.A., Vaucher, N.P., Platz, R., Hof, Ch, Kroll, U., Meier, J., Torres, P., Keppner, H., Wyrsch, N., Goetz, M., Shah, A., Ufert, K.-D.
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creator Fischer, D.
Dubail, S.
Selvan, J.A.A.
Vaucher, N.P.
Platz, R.
Hof, Ch
Kroll, U.
Meier, J.
Torres, P.
Keppner, H.
Wyrsch, N.
Goetz, M.
Shah, A.
Ufert, K.-D.
description Progress of solar cells based on plasma deposited hydrogenated microcrystalline silicon (/spl mu/c-Si:H), as well as on combined a-Si:H//spl mu/c-Si:H stacked "micromorph" solar cells is reported. /spl mu/c-Si:H p-i-n cells with a thickness of 3.6 /spl mu/m, deposited with the use of a gas-purifier, are shown to have a short-circuit current of over 25 mA/cm/sup 2/, and a stable efficiency of 7.7%. a-Si:H//spl mu/c-Si:H tandem cells with 13% initial, and with 10% degraded state efficiency are also demonstrated. In addition, methods to further increase the efficiency of combined a-Si:H//spl mu/c-Si:H solar cells are discussed. This includes the introduction of a ZnO reflector layer between a-Si:H and /spl mu/c-Si:H component cells, a new concept of which first experimental results are given.
doi_str_mv 10.1109/PVSC.1996.564311
format conference_proceeding
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language eng
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Absorption
Crystallization
Frequency
Photovoltaic cells
PIN photodiodes
Plasma materials processing
Plasma temperature
Semiconductor thin films
Silicon
Substrates
title The "micromorph" solar cell: extending a-Si:H technology towards thin film crystalline silicon
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